采用氢氧化镍制备具有优异浴液稳定性的化学镀NiSnP

T. Kanno, Y. Umeda, H. Honma, O. Takai, K. Tashiro
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摘要

总的来说,NiSn合金是一种具有优雅光泽和优异耐腐蚀性的镀层。电镀方法已达到实际应用水平,因为可以获得高含锡膜。另一方面,化学镀方法还没有达到实际应用的水平,因为沉积膜中的锡含量低,而且耐腐蚀性不够。作者对化学镀液的组成进行了详细的研究,以获得锡含量在50%以上的NiSnP薄膜。特别是用氢氧化镍代替硫酸镍作为镍源,提高了镀液的稳定性,获得了较高的锡含量。研究了镀液中Ni源对沉积膜的影响。以氢氧化镍为Ni源的镀液几乎不受镀液比例的影响。此外,镀液中溶解氧(DO)的含量也会随着Ni源的不同而变化,从而影响沉积膜的组成和镀液的稳定性。结果表明,使用氢氧化镍的化学镀液具有优异的镀液稳定性,可适用于相对广泛的电镀操作条件,以获得高含锡膜。此外,通过增加膜中Sn的含量可以提高膜的耐蚀性。高锡含量的NiSnP不溶于硝酸。
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Development of electroless NiSnP plating with excellent bath stability using nickel hydroxide
ABSTRACT In general, NiSn alloys are known as plating films with elegant lustre and excellent corrosion resistance. Electroplating methods have already reached a practical application level because high Sn-containing films can be obtained. On the other hand, electroless plating methods have not yet reached the level of practical application because the Sn content in the deposited film is not only low but also the corrosion resistance is not sufficient. The authors have studied in detail the composition of electroless plating baths to obtain NiSnP films with Sn content above 50 wt%. In particular, the plating bath using nickel hydroxide instead of nickel sulphate as the Ni source increased bath stability and obtained high Sn content. The effects of Ni source in the bath on the deposition films were studied. The bath using nickel hydroxide as the Ni source was almost unaffected by the bath ratio. Furthermore, the amount of dissolved oxygen (DO) in the plating bath also varied depending on the Ni source, affecting the composition of the deposited film and the bath stability. It was confirmed that electroless plating baths using nickel hydroxide have excellent bath stability and can be applied to a relatively wide range of plating operation conditions to obtain high Sn-containing films. In addition, the corrosion resistance was improved by increasing the Sn content in the film. It was also confirmed that the NiSnP with high Sn content does not dissolve in nitric acid.
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