利用纳米光子抛光实现具有埃级平均粗糙度的超平坦二氧化硅表面

2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science Pub Date : 2008-05-04 DOI:10.1109/CLEO.2008.4551310

T. Yatsui, W. Nomura, M. Ohtsu, K. Hirata, Y. Tabata

{"title":"利用纳米光子抛光实现具有埃级平均粗糙度的超平坦二氧化硅表面","authors":"T. Yatsui, W. Nomura, M. Ohtsu, K. Hirata, Y. Tabata","doi":"10.1109/CLEO.2008.4551310","DOIUrl":null,"url":null,"abstract":"We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, R a, and the dispersion of R a.","PeriodicalId":6382,"journal":{"name":"2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science","volume":"15 1","pages":"1-2"},"PeriodicalIF":0.0000,"publicationDate":"2008-05-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":"{\"title\":\"Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing\",\"authors\":\"T. Yatsui, W. Nomura, M. Ohtsu, K. Hirata, Y. Tabata\",\"doi\":\"10.1109/CLEO.2008.4551310\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, R a, and the dispersion of R a.\",\"PeriodicalId\":6382,\"journal\":{\"name\":\"2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science\",\"volume\":\"15 1\",\"pages\":\"1-2\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-05-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"3\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CLEO.2008.4551310\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEO.2008.4551310","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}

引用次数: 3

摘要

我们报道了使用非绝热光化学反应对二氧化硅衬底进行纳米光子抛光，大大降低了平均表面粗糙度，R a和R a的色散。

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Realization of an ultra-flat silica surface with angstrom-scale average roughness using nanophotonic polishing

We report that nanophotonic polishing of a silica substrate using a nonadiabatic photochemical reaction drastically reduced the average surface roughness, R _a, and the dispersion of R _a.

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2008 Conference on Lasers and Electro-Optics and 2008 Conference on Quantum Electronics and Laser Science

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