{"title":"通过介电界面的环形聚焦:扫描和限制强度","authors":"S. H. Wiersma, T. Visser, P. Török","doi":"10.1088/0963-9659/7/5/029","DOIUrl":null,"url":null,"abstract":"We study the problem of light focusing by a high-aperture lens through a planar interface between two media with different refractive indices. It is demonstrated how, by using annular illumination, the intensity distribution can be significantly confined. A new scanning mechanism is proposed to continuously probe the intensity peak through the second medium. This mechanism may be applied in, for example, lithography and three-dimensional imaging.","PeriodicalId":20787,"journal":{"name":"Pure and Applied Optics: Journal of The European Optical Society Part A","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"1998-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"14","resultStr":"{\"title\":\"ANNULAR FOCUSING THROUGH A DIELECTRIC INTERFACE : SCANNING AND CONFINING THE INTENSITY\",\"authors\":\"S. H. Wiersma, T. Visser, P. Török\",\"doi\":\"10.1088/0963-9659/7/5/029\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"We study the problem of light focusing by a high-aperture lens through a planar interface between two media with different refractive indices. It is demonstrated how, by using annular illumination, the intensity distribution can be significantly confined. A new scanning mechanism is proposed to continuously probe the intensity peak through the second medium. This mechanism may be applied in, for example, lithography and three-dimensional imaging.\",\"PeriodicalId\":20787,\"journal\":{\"name\":\"Pure and Applied Optics: Journal of The European Optical Society Part A\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"14\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Pure and Applied Optics: Journal of The European Optical Society Part A\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/0963-9659/7/5/029\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Pure and Applied Optics: Journal of The European Optical Society Part A","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/0963-9659/7/5/029","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
ANNULAR FOCUSING THROUGH A DIELECTRIC INTERFACE : SCANNING AND CONFINING THE INTENSITY
We study the problem of light focusing by a high-aperture lens through a planar interface between two media with different refractive indices. It is demonstrated how, by using annular illumination, the intensity distribution can be significantly confined. A new scanning mechanism is proposed to continuously probe the intensity peak through the second medium. This mechanism may be applied in, for example, lithography and three-dimensional imaging.
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