用C-AFM和KPFM技术研究NiO薄膜的纳米电性能:晶界势垒的影响

{"title":"用C-AFM和KPFM技术研究NiO薄膜的纳米电性能:晶界势垒的影响","authors":"Yidong Zhang, Junxiang Zuo, Pinjiang Li, Yuan-hao Gao, Weiwei He, Zhi Zheng","doi":"10.1016/J.PHYSE.2019.03.005","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":20078,"journal":{"name":"Physica E: Low-dimensional Systems and Nanostructures","volume":"307 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2019-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":"{\"title\":\"Study of the nanoscale electrical performance of NiO thin films by C-AFM and KPFM techniques: The effect of grain boundary barrier\",\"authors\":\"Yidong Zhang, Junxiang Zuo, Pinjiang Li, Yuan-hao Gao, Weiwei He, Zhi Zheng\",\"doi\":\"10.1016/J.PHYSE.2019.03.005\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":20078,\"journal\":{\"name\":\"Physica E: Low-dimensional Systems and Nanostructures\",\"volume\":\"307 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2019-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"11\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Physica E: Low-dimensional Systems and Nanostructures\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1016/J.PHYSE.2019.03.005\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Physica E: Low-dimensional Systems and Nanostructures","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1016/J.PHYSE.2019.03.005","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}