{"title":"二维网状聚合物LB膜的分子图谱2:电子束绘制图谱","authors":"Tokuji Miyashita, Masakazu Nakaya, Atsushi Aoki","doi":"10.1016/S0968-5677(98)00032-7","DOIUrl":null,"url":null,"abstract":"<div><p>Electron beam lithography was investigated using a cross-linkable polymer Langmuir–Blodgett (LB) film. Cross-linking reaction occurs in the LB film with electron beam irradiation as well as UV light irradiation and the irradiated LB film becomes insoluble in the organic solvents to form a two-dimensional network in the LB film. The sensitivity and contrast of the cross-linkable polymer LB film are 3<!--> <!-->μC<!--> <!-->cm<sup>-2</sup> and 0.64, respectively. The limiting resolution of patterning is 0.2<!--> <!-->μm line-and-space. The electron beam lithography using the cross-linkable polymer LB film is applicable to the future nanotechnology.</p></div>","PeriodicalId":22050,"journal":{"name":"Supramolecular Science","volume":"5 3","pages":"Pages 363-365"},"PeriodicalIF":0.0000,"publicationDate":"1998-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/S0968-5677(98)00032-7","citationCount":"4","resultStr":"{\"title\":\"Molecular patterning with a two-dimensional network polymer LB film 2: Drawing patterns by an electron beam\",\"authors\":\"Tokuji Miyashita, Masakazu Nakaya, Atsushi Aoki\",\"doi\":\"10.1016/S0968-5677(98)00032-7\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Electron beam lithography was investigated using a cross-linkable polymer Langmuir–Blodgett (LB) film. Cross-linking reaction occurs in the LB film with electron beam irradiation as well as UV light irradiation and the irradiated LB film becomes insoluble in the organic solvents to form a two-dimensional network in the LB film. The sensitivity and contrast of the cross-linkable polymer LB film are 3<!--> <!-->μC<!--> <!-->cm<sup>-2</sup> and 0.64, respectively. The limiting resolution of patterning is 0.2<!--> <!-->μm line-and-space. The electron beam lithography using the cross-linkable polymer LB film is applicable to the future nanotechnology.</p></div>\",\"PeriodicalId\":22050,\"journal\":{\"name\":\"Supramolecular Science\",\"volume\":\"5 3\",\"pages\":\"Pages 363-365\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-07-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/S0968-5677(98)00032-7\",\"citationCount\":\"4\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Supramolecular Science\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0968567798000327\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Supramolecular Science","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0968567798000327","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Molecular patterning with a two-dimensional network polymer LB film 2: Drawing patterns by an electron beam
Electron beam lithography was investigated using a cross-linkable polymer Langmuir–Blodgett (LB) film. Cross-linking reaction occurs in the LB film with electron beam irradiation as well as UV light irradiation and the irradiated LB film becomes insoluble in the organic solvents to form a two-dimensional network in the LB film. The sensitivity and contrast of the cross-linkable polymer LB film are 3 μC cm-2 and 0.64, respectively. The limiting resolution of patterning is 0.2 μm line-and-space. The electron beam lithography using the cross-linkable polymer LB film is applicable to the future nanotechnology.
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