低氢稀释低气压单硅烷等离子体在太阳电池级微晶硅快速沉积中的应用

Toshihiro Tabuchi, Y. Toyoshima, S. Fujimoto, M. Takashiri
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Application of low hydrogen-diluted and low gaseous-pressure monosilane plasma to fast deposition of solar-cell-grade microcrystalline silicon
Toshihiro Tabuchi, Yasumasa Toyoshima, Shinichi Fujimoto, and Masayuki Takashiri 1Development Division, Komatsu Ltd., 1200 Manda, Hiratsuka, Kanagawa 254-8567, Japan 2KELK Ltd., 3-25-1 Shinomiya, Hiratsuka, Kanagawa 254-8543 Japan 3Department of Materials Science, Tokai University, 4-1-1 Kitakaname, Hiratsuka, Kanagawa 259-1292, Japan * Corresponding authors: e-mail: toshihiro_tabuchi@komatsu.co.jp, and/or takashiri@tokai-u.jp
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