浸入真空容器中的大型负离子源

Y. Oka, Y. Takeiri, O. Kaneko, A. Ando, K. Tsumori, R. Akiyama, T. Kawamoto, T. Kuroda
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引用次数: 2

摘要

为了开发用于大型螺旋装置的强大的负离子基中性束注入系统,在真空容器中对1/3比例的H -源进行了测试。描述了真空浸没大氢源的固有特征。等离子体密度高于约1012 e/cm3。在抽束过程中,发现真空容器中存在束致薄等离子体。为了获得长脉冲光束,对等离子体进行屏蔽,然后对光束进行调理,使光束总能量达到70 keV,持续100 ms,电弧功率约为50 kW。证实了H -电流的标度以及等离子体参数与之前的1/3源的标度相似。
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A Large Negative Ion Source Immersed in the Vacuum Vessel
To develop the powerful negative‐ion‐based neutral beam injection system for the large helical device, a 1/3 scaled H− source has been tested, which is immersed in the vacuum vessel. Intrinsic features of the vacuum‐immersed large H− source are described. Plasma density of higher than about 1012 e/cm3 is produced. During the beam extraction, it was found that a beam‐induced thin plasma exists in the vacuum vessel. In order to get a long pulse beam, this plasma was shielded and then the beam conditioning was completed up to the total beam energy of 70 keV for 100 ms, with the arc power up to about 50 kW. It is confirmed that H− current scaling as well as the plasma parameters would be similar to the scaling which is achieved by the previous 1/3 source.
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