直流磁控溅射过程中靶表面温度的变化

IF 0.9 4区 物理与天体物理 Q4 PHYSICS, APPLIED European Physical Journal-applied Physics Pub Date : 2020-10-01 DOI:10.1051/epjap/2020200098
L. Shaginyan, V. Shaginyan, A. Kuzmichev, M. Mironov
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引用次数: 3

摘要

成功地开发了一种新的简单的目标表面温度测量方法,并对其进行了详细的描述。在测量温度的同时,我们还用专门为此开发的方法测量了每个目标的发射率。测量表明,由Cu, Mo, Nb光盘制备的目标的表面温度可能大大(高达~ 300°C)超过目标体积的温度。给出了“目标表面温度”的定义。假设离子轰击目标表面出现的表层厚度等于或接近离子轰击目标的穿透深度。提出了解释表层形成的物理模型。该模型的主要思想是,轰击目标的Ar离子可以有效地将其动能大部分转移到离子子系统,而不是转移到目标的电子子系统。由于层内金属离子的迁移率非常低,层的热导率与其他目标体积相比大大降低。因此,该层的温度高于目标的其余部分的温度。
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On the target surface temperature during dc magnetron sputtering
New simple method for target surface temperature (TST) measurements is successfully developed and described in detail. Along with temperature measurements we measured also the emissivity of each of targets by the method specially developed for this aim. The measurements demonstrate that the surface temperature of the targets prepared from Cu, Mo, Nb discs may substantially (up to ∼300 °C) exceed the temperature of the volume of the target. The definition of a “target surface temperature” is given. It is supposed that the thickness of the surface layer that appears on a target subjected to the ion bombardment is equal or close to the penetration depth of ions bombarding the target. The physical model explaining the formation of the surface layer is suggested. The main idea of the model is that the Ar ions bombarding the target may effectively transfer their kinetic energy mostly to the ionic subsystem rather than to the electron subsystem of a target. Due to very low mobility of metal ions within the layer the thermal conductivity of the layer is substantially lower compared to the rest target volume. As a result the temperature of the layer is higher than that of the rest part of the target.
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来源期刊
CiteScore
1.90
自引率
10.00%
发文量
84
审稿时长
1.9 months
期刊介绍: EPJ AP an international journal devoted to the promotion of the recent progresses in all fields of applied physics. The articles published in EPJ AP span the whole spectrum of applied physics research.
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