在4 MV/cm的太赫兹场中偏置InP的带间跃迁

C. Schmidt, O. Schubert, F. Junginger, S. Mahrlein, B. Mayer, A. Sell, R. Huber, A. Leitenstorfer
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引用次数: 2

摘要

强电场对半导体电子特性的影响是基础科学和高速电子应用中特别感兴趣的问题。使用大型准静态场[1]和太赫兹场[2]进行了研究。然而,由于稳定偏压下的介质击穿和强相稳定太赫兹源的可用性,可获得的场振幅被限制在通常低于1 MV/cm的值。
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Interband transitions in InP biased with THz fields of 4 MV/cm
The influence of strong electric fields on electronic properties of semiconductors is of particular interest both for fundamental science and applications in high speed electronics. Investigations using large quasi-static [1] and THz [2] fields have been performed. However, the accessible field amplitudes have been limited to values typically below 1 MV/cm due to the dielectric breakdown under stationary bias and the availability of intense phase-stable THz sources, respectively.
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