多肽类受控序列光刻胶

{"title":"多肽类受控序列光刻胶","authors":"F. Kaefer, Z. MEng, R. Segalman, C. Ober","doi":"10.2494/photopolymer.35.29","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.4000,"publicationDate":"2022-12-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"Controlled Sequence Photoresists from Polypeptoids\",\"authors\":\"F. Kaefer, Z. MEng, R. Segalman, C. Ober\",\"doi\":\"10.2494/photopolymer.35.29\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":16810,\"journal\":{\"name\":\"Journal of Photopolymer Science and Technology\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.4000,\"publicationDate\":\"2022-12-16\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Photopolymer Science and Technology\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://doi.org/10.2494/photopolymer.35.29\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"POLYMER SCIENCE\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Photopolymer Science and Technology","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.2494/photopolymer.35.29","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"POLYMER SCIENCE","Score":null,"Total":0}