{"title":"薄膜电极应力变化的原位测量","authors":"J. Scarminio, S. N. Sahu, F. Decker","doi":"10.1088/0022-3735/22/9/014","DOIUrl":null,"url":null,"abstract":"An optical system with a laser-beam position detector has been used for in situ measurement of the changes of the mechanical stress in thin films during electrochemical reactions. This non-interferometric system can measure stress variations as low as 106 N m-2 with response times better than 1.0 s.","PeriodicalId":16791,"journal":{"name":"Journal of Physics E: Scientific Instruments","volume":"26 1","pages":"755-757"},"PeriodicalIF":0.0000,"publicationDate":"1989-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":"{\"title\":\"In situ measurements of the stress changes in thin-film electrodes\",\"authors\":\"J. Scarminio, S. N. Sahu, F. Decker\",\"doi\":\"10.1088/0022-3735/22/9/014\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"An optical system with a laser-beam position detector has been used for in situ measurement of the changes of the mechanical stress in thin films during electrochemical reactions. This non-interferometric system can measure stress variations as low as 106 N m-2 with response times better than 1.0 s.\",\"PeriodicalId\":16791,\"journal\":{\"name\":\"Journal of Physics E: Scientific Instruments\",\"volume\":\"26 1\",\"pages\":\"755-757\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1989-09-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"11\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Physics E: Scientific Instruments\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1088/0022-3735/22/9/014\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Physics E: Scientific Instruments","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1088/0022-3735/22/9/014","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 11
摘要
采用激光位置检测器光学系统，对电化学反应过程中薄膜机械应力的变化进行了原位测量。这种非干涉测量系统可以测量低至106 N m-2的应力变化，响应时间优于1.0 s。
In situ measurements of the stress changes in thin-film electrodes
An optical system with a laser-beam position detector has been used for in situ measurement of the changes of the mechanical stress in thin films during electrochemical reactions. This non-interferometric system can measure stress variations as low as 106 N m-2 with response times better than 1.0 s.
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