用单掩膜倾斜UV光刻曝光和氧等离子体蚀刻制备高通量电池电穿孔阵列

T. Suzuki, H. Yamamoto, M. Ohoka, A. Okonogi, H. Kabata, I. Kanno, M. Washizu, H. Kotera
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引用次数: 12

摘要

在本文中,我们提出了一种具有高密度排列微孔的多细胞处理阵列,该阵列具有可单独访问的微通道和电极。采用单掩模倾斜UV光刻嵌入网络(SIMPLE)工艺,采用氧等离子体蚀刻技术,可同时制备10000多个直径为2微米的微孔。超过200个活细胞固定在排列的微孔中,通过电穿孔渗透,并允许摄取外来的不含物质。
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High Throughput Cell Electroporation Array Fabricated by Single-Mask Inclined UV Lithography Exposure and Oxygen Plasma Etching
In this paper, we propose a multiple cell treatment array with high-density arrayed micro-orifice having an individually accessible microchannel and electrodes. More than 10000 micro-orifices with the diameter of 2 mum can be simultaneously fabricated by Single-Mask inclined UV photolithography for embedded network (SIMPLE) process with the oxygen plasma etching. More than 200 living cells immobilized at the arrayed micro-orifices were permeabilized by electroporation and allowed to uptake an foreign impermeant substance.
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