氢催化氧化铜制备均匀铜颗粒及其还原动力学

Shuichi Hamada, Yoshiyuki Kudo, Toshio Tojo
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引用次数: 18

摘要

在69 ~ 111℃下,用氢还原铜(I)氧化物,制得均匀的铜颗粒。用葡萄糖还原不同浓度的Fehling溶液,制得三种前驱体颗粒,其平均模态尺寸分别为0.46、0.62和1.26 μm。细氧化铜颗粒的还原是通过自催化过程进行的,而粗氧化铜颗粒的反应速率是由后期形成的铜层中气体的扩散控制的。所得的铜颗粒保留了氧化物的原始形态。通过光电子表面微分析(XPS)在空气中检测到约30 Å厚的中等富氧层。
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Preparation and reduction kinetics of uniform copper particles from copper(I) oxides with hydrogen

Uniform copper particles were prepared by reduction of copper(I) oxides with hydrogen at 69–111°C. Three types of precursor particles having average modal sizes of O.46, 0.62 and 1.26 μm, respectively were produced by reducing Fehling's solutions of different concentrations with glucose. The reduction of fine copper(I) oxide particles took place through an autocatalytic process, while the reaction rates of rather coarse oxide particles were controlled by the diffusion of gaseous species through the copper layers formed at a later stage of the process. The resulting copper particles retained the original morphology of the oxides. A moderately oxygen-rich layer about 30 Å thick was detected on exposure to air by means of photoelectron surface microanalysis (XPS).

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