利用MVT方法的概念,设计了一种低功耗、高速度和节能的45纳米3晶体管异或门

Krishnendu Dhar
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引用次数: 4

摘要

本文利用混合阈值电压(MVT)方法的概念,提出了一种低功耗、高速度、高能效的45纳米技术3个晶体管的异或门的设计。与传统CMOS晶体管、传输门和互补通管逻辑(CPL)相比,所提出的设计在平均功耗(Pavg)、峰值功耗(Ppeak)、延迟时间、功率延迟积(PDP)和能量延迟积(EDP)方面分别显示出大量的衰减。已经发现,Pavg最小为6.72×10-11 W,而Ppeak最小为1.11×10-6 W。进一步计算发现,延迟时间低至1.05皮秒,因此在0.9伏电源下,PDP小至7.07×10-23焦耳,而EDP小至7.45×10-35 j。除此之外,由于晶体管数量的减少,表面积也显著减少。所提出的设计已在Tanner S PICE中进行了仿真,并在Microwind中调制了布局。
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Design of a low power, high speed and energy efficient 3 transistor XOR gate in 45nm technology using the conception of MVT methodology
This paper puts forward the design of a low power, high speed and energy efficient XOR gate comprising only 3 transistors in 45nm technology using the conception of Mixed Threshold Voltage (MVT) methodology. On comparison with the conventional CMOS transistors, transmission gates and Complementary Pass-Transistor Logic (CPL), the proposed design showed a substantial amount of depreciation in Average Power consumption (Pavg), Peak Power consumption (Ppeak), delay time, Power Delay Product (PDP) and Energy Delay Product (EDP), respectively. It has been found that Pavg is as small as 6.72×10-11 W while Ppeak is as small as 1.11×10-6 W. On further computation, it has been found that delay time is as low as 1.05pico second and hence PDP is as small as 7.07×10-23 Joule whereas EDP is as less as 7.45×10-35 Js for 0.9 volt power supply. In addition to this, due to reduced transistor count, surface area is also remarkably reduced. The simulation for the proposed design has been carried out in Tanner S PICE and the layout has been concocted in Microwind.
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