高χ嵌段共聚物DSA的多功能面漆策略

IF 0.4 4区 化学 Q4 POLYMER SCIENCE Journal of Photopolymer Science and Technology Pub Date : 2021-06-11 DOI:10.2494/photopolymer.34.11
X. Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, P. Bézard, M. Sérégé, C. Petit-Etienne, G. Gay, G. Cunge, Benjamin Cabannes-Boué, C. Nicolet, C. Navarro, I. Cayrefourcq, Marcus Müller, G. Hadziioannou, I. Iliopoulos, G. Fleury, M. Zelsmann
{"title":"高χ嵌段共聚物DSA的多功能面漆策略","authors":"X. Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, P. Bézard, M. Sérégé, C. Petit-Etienne, G. Gay, G. Cunge, Benjamin Cabannes-Boué, C. Nicolet, C. Navarro, I. Cayrefourcq, Marcus Müller, G. Hadziioannou, I. Iliopoulos, G. Fleury, M. Zelsmann","doi":"10.2494/photopolymer.34.11","DOIUrl":null,"url":null,"abstract":"A concept of patternable top-coats dedicated to directed self-assembly of high- χ block copolymers is detailed, where the design enables a crosslinking reaction triggered by thermal or photo-activation. Nanostructured BCP areas with controlled domains orientation are selected through a straightforward top-coat lithography step with unique integration pathways. Additionally, the crosslinked nature of the material enables the suppression of the BCP dewetting, while exhibiting exceptional capabilities for the construction of 3D stacks.","PeriodicalId":16810,"journal":{"name":"Journal of Photopolymer Science and Technology","volume":null,"pages":null},"PeriodicalIF":0.4000,"publicationDate":"2021-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers\",\"authors\":\"X. Chevalier, Cindy Gomes Correia, Gwenaelle Pound-Lana, P. Bézard, M. Sérégé, C. Petit-Etienne, G. Gay, G. Cunge, Benjamin Cabannes-Boué, C. Nicolet, C. Navarro, I. Cayrefourcq, Marcus Müller, G. Hadziioannou, I. Iliopoulos, G. Fleury, M. Zelsmann\",\"doi\":\"10.2494/photopolymer.34.11\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A concept of patternable top-coats dedicated to directed self-assembly of high- χ block copolymers is detailed, where the design enables a crosslinking reaction triggered by thermal or photo-activation. Nanostructured BCP areas with controlled domains orientation are selected through a straightforward top-coat lithography step with unique integration pathways. Additionally, the crosslinked nature of the material enables the suppression of the BCP dewetting, while exhibiting exceptional capabilities for the construction of 3D stacks.\",\"PeriodicalId\":16810,\"journal\":{\"name\":\"Journal of Photopolymer Science and Technology\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.4000,\"publicationDate\":\"2021-06-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Journal of Photopolymer Science and Technology\",\"FirstCategoryId\":\"92\",\"ListUrlMain\":\"https://doi.org/10.2494/photopolymer.34.11\",\"RegionNum\":4,\"RegionCategory\":\"化学\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"POLYMER SCIENCE\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Photopolymer Science and Technology","FirstCategoryId":"92","ListUrlMain":"https://doi.org/10.2494/photopolymer.34.11","RegionNum":4,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"POLYMER SCIENCE","Score":null,"Total":0}
引用次数: 2

摘要

详细介绍了用于高χ嵌段共聚物定向自组装的可图案面漆的概念,其中设计可以通过热或光激活触发交联反应。通过具有独特集成路径的简单面涂层光刻步骤,选择具有可控畴方向的纳米结构BCP区域。此外,材料的交联特性能够抑制BCP脱湿,同时表现出构建3D堆栈的卓越能力。
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Multifunctional Top-Coats Strategy for DSA of High-χ Block Copolymers
A concept of patternable top-coats dedicated to directed self-assembly of high- χ block copolymers is detailed, where the design enables a crosslinking reaction triggered by thermal or photo-activation. Nanostructured BCP areas with controlled domains orientation are selected through a straightforward top-coat lithography step with unique integration pathways. Additionally, the crosslinked nature of the material enables the suppression of the BCP dewetting, while exhibiting exceptional capabilities for the construction of 3D stacks.
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来源期刊
CiteScore
1.50
自引率
25.00%
发文量
0
审稿时长
4-8 weeks
期刊介绍: Journal of Photopolymer Science and Technology is devoted to the publication of articles on the scientific progress and the technical development of photopolymers.
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