{"title":"[Ta2O5]1-x[TiO2]x， (x = 0.08)薄膜的光学性质","authors":"A. Bhandari, N. S. Panwar","doi":"10.1080/07315171.2021.1923117","DOIUrl":null,"url":null,"abstract":"Abstract Thin films of [Ta2O5]1-x-[TiO2]x, with x = 0.08, were deposited on quartz substrates (for optical study) and p- type mono- crystalline silicon (100) surfaces (for structural characterization and electrical measurements) by RF magnetron sputtering of [Ta2O5]0.92-[TiO2]0.08, ceramic target, using argon as sputtering gas and oxygen as reactive gas. Films were deposited at room temperature and further annealed at 400, 500, 600 and 700 0C, at ambient atmosphere. The observed XRD patterns show that the as- deposited and annealed films have crystalline structure. The spectral transmissions of the [Ta2O5]1-x-[TiO2]x (x = 0.08) films were measured in UV-visible range. The low optical transmittance in as-deposited films may be due to the presence of unreacted tantalum along with Ta2O5 in the films. From the observed transmission spectra, refractive index, optical band gap, absorption coefficient, extinction coefficient, and thickness of prepared [Ta2O5]0.92-[TiO2]0.08 films, have been calculated by Swanepoel’s envelope technique.","PeriodicalId":50451,"journal":{"name":"Ferroelectrics Letters Section","volume":"90 1","pages":"20 - 30"},"PeriodicalIF":1.3000,"publicationDate":"2021-04-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Optical properties of [Ta2O5]1-x[TiO2]x, (x = 0.08) thin films\",\"authors\":\"A. Bhandari, N. S. Panwar\",\"doi\":\"10.1080/07315171.2021.1923117\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract Thin films of [Ta2O5]1-x-[TiO2]x, with x = 0.08, were deposited on quartz substrates (for optical study) and p- type mono- crystalline silicon (100) surfaces (for structural characterization and electrical measurements) by RF magnetron sputtering of [Ta2O5]0.92-[TiO2]0.08, ceramic target, using argon as sputtering gas and oxygen as reactive gas. Films were deposited at room temperature and further annealed at 400, 500, 600 and 700 0C, at ambient atmosphere. The observed XRD patterns show that the as- deposited and annealed films have crystalline structure. The spectral transmissions of the [Ta2O5]1-x-[TiO2]x (x = 0.08) films were measured in UV-visible range. The low optical transmittance in as-deposited films may be due to the presence of unreacted tantalum along with Ta2O5 in the films. From the observed transmission spectra, refractive index, optical band gap, absorption coefficient, extinction coefficient, and thickness of prepared [Ta2O5]0.92-[TiO2]0.08 films, have been calculated by Swanepoel’s envelope technique.\",\"PeriodicalId\":50451,\"journal\":{\"name\":\"Ferroelectrics Letters Section\",\"volume\":\"90 1\",\"pages\":\"20 - 30\"},\"PeriodicalIF\":1.3000,\"publicationDate\":\"2021-04-29\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Ferroelectrics Letters Section\",\"FirstCategoryId\":\"101\",\"ListUrlMain\":\"https://doi.org/10.1080/07315171.2021.1923117\",\"RegionNum\":4,\"RegionCategory\":\"物理与天体物理\",\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"Q4\",\"JCRName\":\"PHYSICS, CONDENSED MATTER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Ferroelectrics Letters Section","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1080/07315171.2021.1923117","RegionNum":4,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"PHYSICS, CONDENSED MATTER","Score":null,"Total":0}
Optical properties of [Ta2O5]1-x[TiO2]x, (x = 0.08) thin films
Abstract Thin films of [Ta2O5]1-x-[TiO2]x, with x = 0.08, were deposited on quartz substrates (for optical study) and p- type mono- crystalline silicon (100) surfaces (for structural characterization and electrical measurements) by RF magnetron sputtering of [Ta2O5]0.92-[TiO2]0.08, ceramic target, using argon as sputtering gas and oxygen as reactive gas. Films were deposited at room temperature and further annealed at 400, 500, 600 and 700 0C, at ambient atmosphere. The observed XRD patterns show that the as- deposited and annealed films have crystalline structure. The spectral transmissions of the [Ta2O5]1-x-[TiO2]x (x = 0.08) films were measured in UV-visible range. The low optical transmittance in as-deposited films may be due to the presence of unreacted tantalum along with Ta2O5 in the films. From the observed transmission spectra, refractive index, optical band gap, absorption coefficient, extinction coefficient, and thickness of prepared [Ta2O5]0.92-[TiO2]0.08 films, have been calculated by Swanepoel’s envelope technique.
期刊介绍：
Ferroelectrics Letters is a separately published section of the international journal Ferroelectrics. Both sections publish theoretical, experimental and applied papers on ferroelectrics and related materials, including ferroelastics, ferroelectric ferromagnetics, electrooptics, piezoelectrics, pyroelectrics, nonlinear dielectrics, polymers and liquid crystals.
Ferroelectrics Letters permits the rapid publication of important, quality, short original papers on the theory, synthesis, properties and applications of ferroelectrics and related materials.
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