野带边:带隙分级和带边波动在高效硫系器件中的作用

I. Repins, L. Mansfield, A. Kanevce, S. Jensen, D. Kuciauskas, Stephen Glynn, T. Barnes, W. Metzger, J. Burst, Chunsheng Jiang, P. Dippo, S. Harvey, G. Teeter, C. Perkins, B. Egaas, A. Zakutayev, Jan-Hendrik Alsmeier, Thomas Lusky, L. Korte, R. Wilks, M. Bar, Yanfa Yan, S. Lany, P. Zawadzki, Ji-Sang Park, S. Wei
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引用次数: 8

摘要

带边效应——包括分级、静电波动、带隙波动和带尾——会影响硫系化物器件的效率。随着效率提高到20%以上,这些影响现在需要更加仔细地考虑。研究了NREL吸收器带边现象与器件性能之间关系的几个方面。对于Cu(In, Ga)Se2器件,最近扩散长度的增加意味着最佳带隙分布的变化。讨论了静电和带隙波动的来源、影响和修正。考虑到材料性能的差异,研究了基于CdTe, kesterites和新兴吸收剂(Cu2SnS3, CuSbS2)的相同原理在器件中的应用。
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Wild band edges: The role of bandgap grading and band-edge fluctuations in high-efficiency chalcogenide devices
Band-edge effects - including grading, electrostatic fluctuations, bandgap fluctuations, and band tails - affect chalcogenide device efficiency. These effects now require more careful consideration as efficiencies increase beyond 20%. Several aspects of the relationships between band-edge phenomena and device performance for NREL absorbers are examined. For Cu(In, Ga)Se2 devices, recent increases in diffusion length imply changes to the optimum bandgap profile. The origin, impact, and modification of electrostatic and bandgap fluctuations are also discussed. The application of the same principles to devices based on CdTe, kesterites, and emerging absorbers (Cu2SnS3, CuSbS2), considering differences in materials properties, is examined.
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