刮伤金属PSEE的两过程模型

Hidemi Shigekawa, Shin-ichi Hyodo
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引用次数: 0

摘要

当光照射中断时,划痕金属样品的外电子发射迅速衰减。然而,当恢复照明时,恢复的外电子发射会急剧上升到一个明显高于之前的值,然后逐渐下降,这是以前的研究人员忽略的一个事实。为了解释PSEE(光激发外电子发射)中的这种“存储效应”,作者提出了一个模型,根据该模型,PSEE过程中存在两个相互竞争的激发过程;一种是表面氧化层带隙内能级电子的光激发,另一种是大块金属中电子的隧穿跃迁,以占据氧化层的空能级。根据基于该模型的速率方程和获得的划痕铝和锌的PSEE数据,成功地估计了三种数量,即外活性位点的数量、位点的发射率和外活性位点的激活率。其他PSEE现象,如特殊的发射强度随时间分布,也可以根据该模型来解释。
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Two-process model of PSEE from scratched metals

When photoillumination is interrupted, the exoelectron emission from scratched metal samples decays quickly. When the illumination is resumed, however, the recovered exoelectron emission shoots up to a value significantly higher than before and then decreases gradually - a fact overlooked by previous researchers. To explain this “storage effect” in PSEE (photo- stimulated exoelectron emission), the authors have proposed a model, according to which there are two excitation processes competing during PSEE; one is the photoexcitation of the electrons at energy levels within the band gap of surface oxide layers, and the other is the tunneling transition of electrons in bulk metals to occupy the vacant levels of the oxide layers. From the rate equations based on this model and also from the PSEE data obtained for scratched aluminum and zinc, three kinds of quantities, i.e., the number of exo-active sites, the emission rate from the sites and the rate of activating exo-inactive sites, are successfully estimated. Other PSEE phenomena such as the peculiar emission intensity versus time profiles can also be elucidated in view of this model.

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