用于柔性神经元和突触器件的异质结构碳包覆Mosse纳米球

Adila Rani, Atul C Khot, Il Gyu Jang, Tae Geun Kim
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引用次数: 1

摘要

本文报道了空位辅助碳填充MoSSe (C@MoSSe)纳米球的合成及其在忆阻器和神经形态器件中的应用。采用简单的水热和超声方法制备了异质结构C@MoSSe纳米球,在柔性衬底上合成了大规模、均匀的C@MoSSe薄膜。碳骨架与异质结构MoSSe纳米球紧密结合,有助于将低sp - 2特性赋予MoSSe纳米球缺陷表面的空缺,从而有助于实现高度稳定的记忆电阻和神经形态性能。此外,MoSSe纯相晶格中的缺陷使带隙增大(~4.39 eV),大于MoSSe本体结构和Janus结构的带隙(分别为1.2 eV和1.9 eV),导致陷阱填充导致载流子输运。C@MoSSe-based忆阻器成功地模拟了突触可塑性的基本和复杂特性,临界时间窗为~460 μs,低于人脑的临界时间窗。双极存储器的性能,如高开/关电流比、合理的低工作电压和稳定性,取决于C@MoSSe层的厚度。研究结果显示了C@MoSSe-based记忆电阻器的应用潜力,可以促进大规模神经形态电路的实现。
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Heterostructure Carbon-Packed Mosse Nanospheres for Flexible Reram and Synapse Devices
This paper reports on the synthesis of vacancy-assisted carbon-packed MoSSe (C@MoSSe) nanospheres and their use in memristor and neuromorphic devices. The heterostructure C@MoSSe nanospheres were fabricated using simple hydrothermal and sonication methods to synthesize large-scale, uniform C@MoSSe films on flexible substrates. The carbon skeleton, tightly adhered to the heterostructure MoSSe nanospheres, helped assign low sp 2 characteristics to the vacancies on the defective surface of the MoSSe nanospheres, thereby facilitating the realization of highly stable memristor and neuromorphic performance. In addition, the defects in the crystal lattice of the pure phase of MoSSe increased the band gap (~4.39 eV) to be larger than the bulk and Janus structure of MoSSe (1.2 and 1.9 eV, respectively), resulting in carrier transport owing to trap filling. The C@MoSSe-based memristor successfully mimicked the basic and complex properties of synaptic plasticity, with a critical time window of ~460 μs, lower than that for the human brain. The bipolar memory performance, such as high on/off current ratio, reasonably low operating voltage, and stability, depended on the thickness of the C@MoSSe layers. The findings demonstrate the application potential of C@MoSSe-based memristors and can promote the realization of large-scale neuromorphic circuits.
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