光辅助MOVPE制备氮化镓铟薄膜的物理性质

T. Nagatomo, O. Omoto
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引用次数: 0

摘要

利用氘(d2)灯的紫外(UV)光辅助MOVPE,可以显著提高GaInN外延膜的光学和电学性能、结晶度和光致发光性能。在d2灯的照射下,nh3的解离被促进,独立原子被有效地结合到GaInN的晶格中。在800℃的生长温度下获得了高质量的外延GaInN薄膜,提高了三甲基lindium (TMIn)的现收率。800℃下生长的GaInN薄膜的光致发光峰值强度(带边发射)是675℃时的14倍。
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Physical Properties of Gallium Indium Nitride Films Prepared by Photo-Assisted MOVPE
The optical and electrical properties, crystallinity, and photoluminescence of GaInN epitaxial films were remarkably improved by photo-assited MOVPE using ultraviolet (UV) light from a deuterium (D 2 ) lamp. The dissociation of NH 3 is promoted by irradiation with a D 2 lamp and indiun atoms are effectively incorporated into the crystal lattice of GaInN. Good-quality epitaxial GaInN films were obtained at higher growth temperature of 800°C increasing the now rate of trimethylindium (TMIn). The photoluminescence peak intensity (band-edge emission) of GaInN films grown at 800°C is 14 times as great as that of 675°C.
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