氮化压力对等离子体氮化硬铬电镀层组织、形态、力学和摩擦学性能的影响

S. Mokhtara, M. Zidani, M. M. Alim, S. Mechachti, S. Messaoudi, L. Mebarki
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引用次数: 0

摘要

研究了硬铬电镀层在600℃、3.5、4和5 Torr三种不同氮气压力下等离子体氮化90分钟后的组织、形态、力学和摩擦性能。结果表明:在4和5 Torr等离子体渗氮后,形成了一层轮廓清晰、形貌粗糙且多孔的Cr2N层,硬铬电镀层的微裂纹几乎被氮化铬填充;他们还表明,将氮气压力从3.5 Torr增加到4 Torr,可显著提高耐磨性。
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Effect of nitriding nitrogen pressure on the structural, morphological, mechanical and tribological properties of plasma nitrided hard chromium electroplated layer
ABSTRACT This paper investigates the structural, morphological, mechanical and tribological properties of a hard chromium electroplated layer plasma nitrided in a pure nitrogen atmosphere at three different nitrogen pressures: 3.5, 4 and 5 Torr for 90 minutes at 600°C. The results showed that after plasma nitriding at 4 and 5 Torr, a well-defined Cr2N layer with a rough and porous morphology was created and the micro-cracks in the hard chromium electroplated layer were almost filled with chromium nitrides. They also showed that increasing the nitrogen pressure from 3.5 to 4 Torr resulted in a significant increase in wear resistance.
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