非厄米二聚体链拓扑边态的敏感性

Zhiwei Guo, Tengzhou Zhang, Juan Song, Haitao Jiang, Hong Chen
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引用次数: 21

摘要

通过映射固态系统的拓扑Su-Schrieffer-Heeger模型,一维二聚体链中的光子拓扑边缘态长期以来被认为对结构扰动具有鲁棒性。然而,有限拓扑二聚体链两端的边缘态会由于近场耦合而相互作用。这导致手性对称的拓扑保护偏离了精确零能量,削弱了拓扑边缘状态的鲁棒性。在非厄米物理的帮助下,可以通过改变结构的增益或损失强度来再次退化边缘状态的分裂频率并恢复拓扑保护。这个聚合点被称为异常点(EP)。EPs在拓扑结构中有趣的物理性质引起了许多有趣的和违反直觉的现象。在这项工作中,我们基于由超亚波长谐振腔组成的有限非厄米二聚体链,从理论上提出并实验验证了当系统通过EP时拓扑边缘态的灵敏度受到很大影响。利用非厄米二聚体链的电位,我们实现了一种新的传感器,它对结构末端的扰动敏感,但在拓扑上不受内部扰动的影响。我们展示的具有EP的非厄米拓扑结构为开发对内部制造误差不敏感但对外部环境变化高度敏感的新型传感器铺平了道路。
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Sensitivity of topological edge states in a non-Hermitian dimer chain
Photonic topological edge states in one-dimensional dimer chains have long been thought to be robust to structural perturbations by mapping the topological Su-Schrieffer-Heeger model of a solid-state system. However, the edge states at the two ends of a finite topological dimer chain will interact as a result of near-field coupling. This leads to deviation from topological protection by the chiral symmetry from the exact zero energy, weakening the robustness of the topological edge state. With the aid of non-Hermitian physics, the splitting frequencies of edge states can be degenerated again and topological protection recovered by altering the gain or loss strength of the structure. This point of coalescence is known as the exceptional point (EP). The intriguing physical properties of EPs in topological structures give rise to many fascinating and counterintuitive phenomena. In this work, based on a finite non-Hermitian dimer chain composed of ultra-subwavelength resonators, we propose theoretically and verify experimentally that the sensitivity of topological edge states is greatly affected when the system passes through the EP. Using the EP of a non-Hermitian dimer chain, we realize a new sensor that is sensitive to perturbation at the end of the structure and yet topologically protected from internal perturbation. Our demonstration of a non-Hermitian topological structure with an EP paves the way for the development of novel sensors that are not sensitive to internal manufacturing errors but are highly sensitive to changes in the external environment.
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