{"title":"锑和氟掺杂氧化锡薄膜的光学和电学性质","authors":"S. Oo, Zayar Thu, Than Zaw Oo, P. Kaung","doi":"10.13189/UJPA.2017.110304","DOIUrl":null,"url":null,"abstract":"The Sb:F:SnO 2 layers (AR) were prepared by spray pyrolysis method. The anti-reflective layers (AR) heat-treated at 500℃ for 30 min (solution amount 20 cc and 25 cc) have shown an improved crystallinity with crystallite size of 38-39 nm, high optical transmission of around 70 % at 450 nm. Incorporation of anti-reflective layer at cathode interface of SiO 2 /Si(N) devices increased the power conversion efficiency from 1.2% to 2.7% which is mainly contributed from photocurrent enhancement. The enhanced efficiency mainly contributed to the increase in J sc . It is attributed to enhanced light absorption and better charge transport in the SiO 2 /Si (N) device with Sb:F:SnO 2 AR layer. Results of optical and electrical studies show that the films are well suited for thin film solar cell as a window layer.","PeriodicalId":23443,"journal":{"name":"Universal Journal of Physics and Application","volume":"7 1","pages":"91-96"},"PeriodicalIF":0.0000,"publicationDate":"2017-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":"{\"title\":\"Optical and Electrical Properties of Antimony and Fluorine Doped Tin Oxide Thin Films\",\"authors\":\"S. Oo, Zayar Thu, Than Zaw Oo, P. Kaung\",\"doi\":\"10.13189/UJPA.2017.110304\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The Sb:F:SnO 2 layers (AR) were prepared by spray pyrolysis method. The anti-reflective layers (AR) heat-treated at 500℃ for 30 min (solution amount 20 cc and 25 cc) have shown an improved crystallinity with crystallite size of 38-39 nm, high optical transmission of around 70 % at 450 nm. Incorporation of anti-reflective layer at cathode interface of SiO 2 /Si(N) devices increased the power conversion efficiency from 1.2% to 2.7% which is mainly contributed from photocurrent enhancement. The enhanced efficiency mainly contributed to the increase in J sc . It is attributed to enhanced light absorption and better charge transport in the SiO 2 /Si (N) device with Sb:F:SnO 2 AR layer. Results of optical and electrical studies show that the films are well suited for thin film solar cell as a window layer.\",\"PeriodicalId\":23443,\"journal\":{\"name\":\"Universal Journal of Physics and Application\",\"volume\":\"7 1\",\"pages\":\"91-96\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Universal Journal of Physics and Application\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.13189/UJPA.2017.110304\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Universal Journal of Physics and Application","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.13189/UJPA.2017.110304","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Optical and Electrical Properties of Antimony and Fluorine Doped Tin Oxide Thin Films
The Sb:F:SnO 2 layers (AR) were prepared by spray pyrolysis method. The anti-reflective layers (AR) heat-treated at 500℃ for 30 min (solution amount 20 cc and 25 cc) have shown an improved crystallinity with crystallite size of 38-39 nm, high optical transmission of around 70 % at 450 nm. Incorporation of anti-reflective layer at cathode interface of SiO 2 /Si(N) devices increased the power conversion efficiency from 1.2% to 2.7% which is mainly contributed from photocurrent enhancement. The enhanced efficiency mainly contributed to the increase in J sc . It is attributed to enhanced light absorption and better charge transport in the SiO 2 /Si (N) device with Sb:F:SnO 2 AR layer. Results of optical and electrical studies show that the films are well suited for thin film solar cell as a window layer.