G. Beshkov, D. Dimitrov, S. Georgiev, T. Dimitrova
{"title":"快速热退火后PECVD薄碳膜的沉积与性能研究","authors":"G. Beshkov, D. Dimitrov, S. Georgiev, T. Dimitrova","doi":"10.1051/JPHYSCOL:1995573","DOIUrl":null,"url":null,"abstract":"In this work the properties of PECVD-carbon films before and after Rapid Thermal Annealing (RTA) are presented. The thickness of the investigated films is in the range 50 - 6000A. The layers are annealed at 1400°C for different times of 1s to 3 min in vacuum 5 x 10 -5 Torr. Raman investigation has been performed before and after annealing.","PeriodicalId":17944,"journal":{"name":"Le Journal De Physique Colloques","volume":"17 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"1995-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Deposition and Properties of Thin PECVD Carbon Films After Rapid Thermal Annealing\",\"authors\":\"G. Beshkov, D. Dimitrov, S. Georgiev, T. Dimitrova\",\"doi\":\"10.1051/JPHYSCOL:1995573\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this work the properties of PECVD-carbon films before and after Rapid Thermal Annealing (RTA) are presented. The thickness of the investigated films is in the range 50 - 6000A. The layers are annealed at 1400°C for different times of 1s to 3 min in vacuum 5 x 10 -5 Torr. Raman investigation has been performed before and after annealing.\",\"PeriodicalId\":17944,\"journal\":{\"name\":\"Le Journal De Physique Colloques\",\"volume\":\"17 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1995-06-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Le Journal De Physique Colloques\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1051/JPHYSCOL:1995573\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Le Journal De Physique Colloques","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1051/JPHYSCOL:1995573","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Deposition and Properties of Thin PECVD Carbon Films After Rapid Thermal Annealing
In this work the properties of PECVD-carbon films before and after Rapid Thermal Annealing (RTA) are presented. The thickness of the investigated films is in the range 50 - 6000A. The layers are annealed at 1400°C for different times of 1s to 3 min in vacuum 5 x 10 -5 Torr. Raman investigation has been performed before and after annealing.
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