GaAs(100)衬底CdTe薄膜中浅层受体的光致发光分析

IF 0.7 Q3 PHYSICS, MULTIDISCIPLINARY Journal of Physical Studies Pub Date : 2021-01-01 DOI:10.30970/jps.25.3701
C. Onodera, Masaaki Yoshida
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引用次数: 0

摘要

在这项研究中,光致发光(PL)测量用于分析砷化镓衬底上未掺杂的碲化镉(cid:28)lms中的浅层受体状态。在1.55 eV波段附近分析了光致发光光谱和时间分辨光谱。未掺杂的碲化镉(cid:28)lm中杂质残留浓度大于1.5 × 10 18cm−3。通过分析脉冲激发后1.55 eV波段的峰移随时间的变化,估计了砷化镓衬底上未掺杂的碲化镉(cid:28)lm的键对键反应常数为2.4 × 10.7 s−1。
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Photoluminescence analysis of shallow acceptor in CdTe films on GaAs(100) substrates
In this study, photoluminescence (PL) measurements are performed for analyzing shallow acceptor states in undoped cadmium telluride (cid:28)lms on gallium arsenide substrates. PL and time-resolved photoluminescence spectra are analyzed in the vicinity of a 1.55 eV band. The residual impurity concentration in the undoped cadmium telluride (cid:28)lm is greater than 1.5 × 10 18 cm − 3 . By analyzing the peak shift of the 1.55 eV band as a function of time after pulsed excitation, the bound-to-bound reaction constant for the undoped cadmium telluride (cid:28)lm on a gallium arsenide substrate is estimated to be 2.4 × 10 7 s − 1 .
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来源期刊
Journal of Physical Studies
Journal of Physical Studies PHYSICS, MULTIDISCIPLINARY-
CiteScore
1.00
自引率
20.00%
发文量
19
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