超尺度硅纳米线热电功率因数的原子模型

A. Paul, Gerhard Klimeck
{"title":"超尺度硅纳米线热电功率因数的原子模型","authors":"A. Paul, Gerhard Klimeck","doi":"10.1109/SNW.2010.5562583","DOIUrl":null,"url":null,"abstract":"Dimensional scaling provides an alternative route to improve the thermoelectric figure of merit (ZT) by the reduction of the lattice thermal conductivity(кl). However, this method is reaching the scaling limit. Further improvement in ZT can be achieved by improving the thermoelectric power-factor (S2G), the numerator of ZT. In this work we study this part of ZT using a combination of semi-empirical Tight-Binding method and Landauer approach. We study the effect of cross-sectional confinement, wire orientation and uniaxial strain on the power-factor (PF). It is found that any improvement in PF is only achieved for wires with cross-section size less than 6nm × 6nm.","PeriodicalId":6433,"journal":{"name":"2010 Silicon Nanoelectronics Workshop","volume":"2 1","pages":"1-2"},"PeriodicalIF":0.0000,"publicationDate":"2010-06-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Atomistic modeling of the thermoelectric power factor in ultra-scaled Silicon nanowires\",\"authors\":\"A. Paul, Gerhard Klimeck\",\"doi\":\"10.1109/SNW.2010.5562583\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Dimensional scaling provides an alternative route to improve the thermoelectric figure of merit (ZT) by the reduction of the lattice thermal conductivity(кl). However, this method is reaching the scaling limit. Further improvement in ZT can be achieved by improving the thermoelectric power-factor (S2G), the numerator of ZT. In this work we study this part of ZT using a combination of semi-empirical Tight-Binding method and Landauer approach. We study the effect of cross-sectional confinement, wire orientation and uniaxial strain on the power-factor (PF). It is found that any improvement in PF is only achieved for wires with cross-section size less than 6nm × 6nm.\",\"PeriodicalId\":6433,\"journal\":{\"name\":\"2010 Silicon Nanoelectronics Workshop\",\"volume\":\"2 1\",\"pages\":\"1-2\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-06-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 Silicon Nanoelectronics Workshop\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SNW.2010.5562583\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 Silicon Nanoelectronics Workshop","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SNW.2010.5562583","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

尺寸缩放提供了另一种途径,通过降低晶格导热系数来提高热电性能值(ZT) (кl)。然而,这种方法正在达到缩放极限。进一步改善ZT可以通过提高ZT分子热电功率因数(S2G)来实现。在这项工作中,我们使用半经验紧密结合方法和Landauer方法的组合来研究ZT的这一部分。研究了截面约束、导线取向和单轴应变对功率因数的影响。研究发现,只有在截面尺寸小于6nm × 6nm的线材上,PF才能得到改善。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
Atomistic modeling of the thermoelectric power factor in ultra-scaled Silicon nanowires
Dimensional scaling provides an alternative route to improve the thermoelectric figure of merit (ZT) by the reduction of the lattice thermal conductivity(кl). However, this method is reaching the scaling limit. Further improvement in ZT can be achieved by improving the thermoelectric power-factor (S2G), the numerator of ZT. In this work we study this part of ZT using a combination of semi-empirical Tight-Binding method and Landauer approach. We study the effect of cross-sectional confinement, wire orientation and uniaxial strain on the power-factor (PF). It is found that any improvement in PF is only achieved for wires with cross-section size less than 6nm × 6nm.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
9 Steep Slope Transistors Frontmatter 5 Metal–Oxide–Semiconductor Field-Effect Transistors A Color Map for 2D Materials 6 Device Simulation
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1