氟掺杂对MgxZn1-xO发射极掺杂的控制

Austin J. Snyder, Jacob M. Gibbs, Manoj K. Jamarkattel, A. Phillips, M. Heben
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引用次数: 1

摘要

发射极的掺杂控制对高性能薄膜光伏器件至关重要。在这里,我们通过ZnO和MgO或MgF的溅射沉积氧化镁锌(MZO)薄膜作为cdte基器件的发射器。在真空和He环境下对MZO薄膜进行热处理前后的带隙和片电阻进行了测量。通过退火,薄膜具有导电性,但用MgO靶和MgF靶沉积的薄膜之间的带隙和片电阻差异很小。将完成器件,以确定在器件加工过程中向MZO薄膜中添加氟是否会影响发射极掺杂。
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Doping Control of MgxZn1-xO Emitter through Fluorine Incorporation
Doping control of the emitter is critically important to high performance thin film photovoltaic devices. Here, we deposit magnesium zinc oxide (MZO) thin films for use as the emitter of CdTe-based devices through cosputtering of ZnO and MgO or MgF. The bandgap and sheet resistance of the MZO films are measured before and after the films are thermally processed under vacuum or in He environments. Through annealing of the films, they become conductive, but little bandgap or sheet resistance differences can be determined between the films deposited using the MgO target or the MgF target. Devices will be completed to determine if the addition of fluorine to the MZO film affects the emitter doping during device processing.
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