负离子溅射过程中的各向异性蚀刻

Applications of Surface Science Pub Date : 1985-05-01 DOI:10.1016/0378-5963(85)90042-X

Russell Messier, Daniel J. Kester

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引用次数: 1

摘要

负离子溅射导致材料的不均匀侵蚀，这可能导致广泛的形态特征。这些不同的表面结构是聚焦轰击过程的结果，这对溅射系统的几何形状和制备参数高度敏感。特征连接的连续方式可以更清楚地理解每个特征。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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Anisotropic etching during negative ion resputtering

Negative ion resputtering leads to a nonuniform erosion of material which can result in a wide range of morphological features. These various surface structures are a consequence of focused bombardment processes which are highly sensitive to sputtering system geometry and preparation parameters. The continuous manner in which the features are connected leads to a clearer understanding of each.

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