用于极高真空的不可蒸发吸气涂层室

M. Stutzman, P. Adderley, M. Mamun, M. Poelker
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引用次数: 10

摘要

介绍了在大直径腔室中进行NEG涂层的技术,以及使用几种泵送配置在腔室中的真空测量,仅使用NEG涂层和小型离子泵,基本压力低至1.56x10^-12 Torr (N2当量)。然后,我们描述了对NEG涂层工艺的修改,以覆盖超冷原子阱实验的复杂几何腔。对NEG包覆样品进行表面分析,测定薄膜的组成和形貌。最后,比较了两个NEG涂层极化电子源室的压力测量结果:杰弗逊实验室的130 kV极化电子源和升级后的350 kV极化2电子源,两者都接近或处于极高真空(XHV)范围内,定义为P<7.5x10^-13 Torr。
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Non-evaporable getter coating chambers for extreme high vacuum
Techniques for NEG coating a large diameter chamber are presented along with vacuum measurements in the chamber using several pumping configurations, with base pressure as low as 1.56x10^-12 Torr (N2 equivalent) with only a NEG coating and small ion pump. We then describe modifications to the NEG coating process to coat complex geometry chambers for ultra-cold atom trap experiments. Surface analysis of NEG coated samples are used to measure composition and morphology of the thin films. Finally, pressure measurements are compared for two NEG coated polarized electron source chambers: the 130 kV polarized electron source at Jefferson Lab and the upgraded 350 kV polarized 2 electron source, both of which are approaching or within the extreme high vacuum (XHV) range, defined as P<7.5x10^-13 Torr.
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