Varied layer thickness improves structural properties of YSZ thin film

In this study, the Yttrium Stabilized Zirconia (YSZ) thin films were deposited on the sapphire substrate (Al2O3) by dip-coating method using simple ethanol-based YSZ suspension. The layer thickness of YSZ films were varied by sintering at 1300°C. Phase change and structural evolution in YSZ films were observed by conducting X-ray diffraction (XRD) analyses. The microstructures and the surface morphology of the deposited films were examined using Atomic Force Microscope (AFM) and Field Emission Scanning Electron Microscope (FESEM). The XRD pattern revealed a phase change from cubic to monoclinic with an increase in YSZ layer thickness. The crystallite size was varied in the range of 9.68–42.98 nm with the changes in the layer thickness. Meanwhile, the AFM image analyses showed a layer thickness-dependent variation in the grain size (205.83–373.77 nm) and the RMS surface roughness (16.72–36.44 nm). The FESEM images of the achieved film exhibited the occurrence of a dense morphology. It was concluded that by controlling the layer thickness of the deposited films, their improved structure and morphology can be achieved.