248 nm和488 nm五羰基铁沉积铁基薄膜的比较研究

I. Voicu, R. Alexandrescu, R. Cireasa, I. Morjan, D. Dumitras, S. Mulenko, A. N. Pogorelyǐ, A. Andrei
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引用次数: 3

摘要

用激光在248 nm和488 nm两个波长下辐照Fe(CO) 5,制备了Fe(CO) 5薄膜。辐照采用垂直几何形状。在λ = 248 nm处沉积速率最高为14 A/s,在λ = 488 nm处沉积速率最高为1.5 A/s,为扩散受限过程。薄膜形貌的SEM分析表明,在248 nm和488 nm处沉积的薄膜在成核和生长方面存在显著差异。XPS表面分析表明,在488nm sio2(石英)衬底上沉积的薄膜表面具有较高的碳含量和碳化物相。随着激光照射时间的延长,薄膜表面出现氧化铁相。讨论了膜的性能与辐照条件和具体机理的关系。
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A Comparative Study of Iron-Based Film Deposition from Iron Pentacarbonyl at 248 nm and 488 nm
Thin film deposition by laser irradiation of Fe(CO) 5 at two radiation wavelengths (248 nm and 488 nm) was performed. A perpendicular geometry of irradiation was used. Maximum deposition rates of 14 A/s at λ = 248 nm and 1.5 A/s at λ = 488 nm were obtained, indicating a diffusion limited process. SEM analysis of film morphologies showed significant differencies in the nucleation and growth of films deposited at 248 nm and 488 nm. XPS surface analysis revealed a higher carbon content and carbidic phases in the surface of films deposited at 488 nm on SiO 2 (quartz) substrates. Oxidized surface Fe phases were found in films, with increasing the exposure time to laser radiation. The film properties are discussed in connection with irradiation conditions and specific mechanisms involved.
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