仿射设计的扩展和共扩展关联图的距离签名

IF 0.4 4区 数学 Q4 MATHEMATICS Algebra Colloquium Pub Date : 2023-06-01 DOI:10.1142/s1005386723000287
Xu Yang, Xiaomin Zhu, Jing Chen
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引用次数: 0

摘要

连通图[公式:见文]的距离矩阵,用[公式:见文]表示,是一个矩阵,它的行和列由顶点集[公式:见文]索引,使得[公式:见文]条目为[公式:见文],其中[公式:见文],[公式:见文]。[Formula: see text]的距离签名[Formula: see text]是[Formula: see text]的惯性。本文确定了仿射设计的扩展(共扩展)关联图的距离特征。此外,我们通过研究匹配数的下界,证明了对仿射设计的扩展(共扩展)关联图的开放涂鸦猜想是成立的。
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Distance Signatures of Extended and Co-extended Incidence Graphs of Affine Designs
The distance matrix of a connected graph [Formula: see text], denoted by [Formula: see text], is the matrix whose rows and columns are indexed by the vertex set [Formula: see text] such that the [Formula: see text]-entry is [Formula: see text], where [Formula: see text], [Formula: see text]. The distance signature [Formula: see text] of [Formula: see text] is the inertia of [Formula: see text]. In this paper, we determine the distance signature of the extended (co-extended) incidence graph of an affine design. Furthermore, we state that an open Graffiti conjecture is true for the extended (co-extended) incidence graphs of affine designs by investigating the lower bound of the matching number.
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来源期刊
Algebra Colloquium
Algebra Colloquium 数学-数学
CiteScore
0.60
自引率
0.00%
发文量
625
审稿时长
15.6 months
期刊介绍: Algebra Colloquium is an international mathematical journal founded at the beginning of 1994. It is edited by the Academy of Mathematics & Systems Science, Chinese Academy of Sciences, jointly with Suzhou University, and published quarterly in English in every March, June, September and December. Algebra Colloquium carries original research articles of high level in the field of pure and applied algebra. Papers from related areas which have applications to algebra are also considered for publication. This journal aims to reflect the latest developments in algebra and promote international academic exchanges.
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