非理想薄膜的形貌和有效光学常数的测定

D.F. Neely, T.L. Tansley, C.P. Foley
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引用次数: 0

摘要

光学技术作为一种非破坏性的方法被广泛用于测定真空沉积薄膜的厚度和有效光学常数。在许多这样的分析中隐含着使用薄膜的理想形态模型。然而,真空沉积薄膜的形貌可能远非理想。讨论了形态特征对薄膜的入射反射率和透射光谱的影响。特别是,将薄膜的非理想表面解释为引起入射光散射的区域,或者通过应用有效介质理论,将其解释为渐变折射率区域。本文采用表面散射和表面梯度折射率模型,对几种溅射薄膜的法向反射光谱和透射光谱进行了比较研究。结果表明,后一种模型适用于具有表面特征的薄膜,其尺寸可达波长的相当一部分。本文还讨论了这些正入射结果对椭偏测量的意义。
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Determination of the morphology and effective optical constants of non-ideal thin films

Optical techniques are widely used as non-destructive methods for determining the thickness and effective optical constants of vacuum deposited thin films. Implicit inmany such analyses is the use of an ideal morphological model of a thin film. The morphology of vacuum deposited thin films, however, may be far from ideal. The influence of morphological features on normal incidence reflectance and transmittance spectra of thin films is discussed. In particular, the interpretation of the non-ideal surface of a thin film as either a region giving rise to scattering of incident light or, by applying effective medium theory, as a region of graded refractive index will be considered. The results of a comparative study of the normal incidence reflectance and transmittance spectra of a number of sputtered thin films using both surface scattering and surface region of graded refractive index models is presented. It is shown that the latter model is preferred for films with surface features with dimensions of up to a considerable fraction of wavelength. The implications of these normal incidence results for ellipsometric measurements are also discussed.

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