筛孔对Ti筛等离子体渗氮低碳钢渗氮性能、耐蚀性和耐磨性的影响

K. Imamura, A. Nishimoto
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引用次数: 0

摘要

为了研究Ti网主动屏等离子体氮化(ASPN)工艺中筛孔状态的影响,对低碳钢S15C进行了ASPN处理和DC等离子体氮化(S - DCPN)处理,采用孔径分别为φ 5mm、10mm和20mm的Ti网,开孔率分别为0%、15%、35%和55%。在75% n2 + 25% h2的气氛下,在873K温度下,300Pa气压下,等离子体渗氮180min。渗氮处理后进行X射线衍射(XRD)、表面显微组织观察、截面显微组织观察、磨损试验、维氏硬度试验、辉光发射光谱(GD - OES)和腐蚀试验。结果表明,在沉积颗粒较小、沉积层较厚的条件下,ASPN处理后的试样的耐磨性得到了提高。在S - DCPN处理后的试样的横截面组织中,证实了由氮化铁组成的复合层和由氮扩散析出γ′- Fe - 4n的扩散层。孔径为20mm、开孔率为55%的筛网表面未形成氮化铁复合层。SEM - EDX的结果也证实了S - DCPN对钛的扩散。[doi:10.2320 / jinstmet.]J2020049](收稿日期:2020年10月14日;2020年11月18日录用;2021年1月22日出版)
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Effect of Screen Open Hole on Nitriding Behavior, Corrosion Resistance and Wear Resistance of Plasma Nitrided Low Carbon Steel Using Ti Screen
In order to investigate the e ff ect of the screen hole state of the active screen plasma nitriding ( ASPN ) process using Ti screen, low carbon steel S15C was treated by ASPN treatment and DC plasma nitriding treatment ( S – DCPN ) using the Ti screen with the hole diameter of ϕ 5mm, 10mm, and 20mm and the open area ratio of 0 % , 15 % , 35 % , and 55 % . Plasma nitriding was performed at 873K for 180min at a gas pressure of 300Pa under an atmosphere of 75 % N 2 + 25 % H 2 . After the nitriding treatment, X – ray di ff raction ( XRD ) , surface microstructure observation, cross – section microstructure observation, wear test, Vickers hardness test, glow discharge optical emission spectrometry ( GD – OES ) , and corrosion test were performed. As a result, the wear resistance of the ASPN – treated samples was improved under the condition that the deposit particles were small and the deposit layer was thick. In the cross – sectional microstructure of the S – DCPN – treated samples, a compound layer composed of iron nitrides and a di ff usion layer in which γ ’ – Fe 4 N was precipitated by nitrogen di ff usion were con fi rmed. The surface compound layer of iron nitrides was not formed when a screen with a hole size of 20mm and open area ratio of 55 % was used. The results of SEM – EDX also con fi rmed the di ff usion of titanium by S – DCPN treatment using a Ti screen. [ doi:10.2320 / jinstmet.J2020049 ] ( Received October 14, 2020; Accepted November 18, 2020; Published January 22, 2021 )
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