近表面损耗层对直接带隙半导体光响应的影响

Keneni Taye Serdo
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摘要

在本研究中,研究了不同掺杂水平、注入水平和光照能量对近表面耗尽层和深层锑化镓(GaSb)光响应的影响。首先,将光子的吸收率描述为样品内部不同位置的照明能量的函数,以及具有不同能量的光子在照射表面以下深度的函数。然后,考虑表面能量弯曲的变化,研究了低注入能级辐射、俄钻和有效多余载流子寿命在表面下和深层块体中的掺杂水平依赖关系。还描述了具有不同掺杂水平的样品的低注入水平过量载流子寿命随照射表面以下深度的变化。随后描述了掺杂和照明能量对整个体在低注入水平下的光响应的综合影响。最后,还描述了不同掺杂水平的样品在光照表面和深层体下过量载流子寿命与过量载流子注入水平的依赖关系。由于光子吸收率与自由载流子的产生速率直接相关,因此光子吸收率随光照能量和照射表面以下深度的函数描述与掺杂和注入水平一起是研究半导体光响应的重要因素。分析结果还表明,下表面区域对掺杂水平不敏感,而深层块体区域受掺杂水平的影响较大。对于不同掺杂的样品,下表面区域光响应的注入水平依赖性是相似的。每个光子的照明能量主要抑制位于样品照射表面下每个光子穿透深度附近的点的光响应。关键词:光响应,直接带隙半导体,锑化镓GaSb DOI: 10.7176/APTA/75-03
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Effect of the Near Surface Depletion Layer on Photo-Response of Direct Band Gap Semiconductor
In this study, the effects of the photo-responses of the near surface depletion layer and the deep bulk of gallium antimonide (GaSb) are investigated under different doping levels, injection level and illumination energies. First, the absorption rate of photons is described as a function of illumination energies at different locations inside the sample and as a function of the depth below the illuminated surface for photons with different energies. Then, the doping level dependence of the low injection level radiative, Auger and effective excess carrier lifetimes just under the surface and in the deep bulk are investigated by considering the variation of energy bending at the surface. The variation of the low injection level excess carrier lifetimes with the depth below the illuminated surface for samples with different doping levels is also described. This is followed by the description of the combined effects of doping and illumination energy on the photo-response of the entire bulk at slightly low injection level. Finally, the excess carrier injection level dependence of excess carrier lifetimes under the illuminated surface and deep bulk is also described for samples with different doping levels. Since photon absorption rate is directly related to the free carriers generation rate, the description of the photon absorption rate as functions of illumination energies and the depth below the illuminated surface is found to be the important and factors in the investigation in the photo-response of semiconductors along with the doping and the injection levels.  The analysis of the results also shows that, the under surface region is insensitive to the doping level and that of the deep bulk is highly affected by the doping level. The injection level dependence of the photo-response of the under surface region is similar for all samples with different doping. The energy of illumination each photon mainly suppresses the photo-responses of the points situated closer to the penetration depths of each photon below the illuminated surface of the sample. Keywords: photo-response, direct band gap semiconductor, gallium antimonide GaSb DOI : 10.7176/APTA/75-03
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