二维p型MOSFET载流子速度的物理模拟

M. Riyadi, M. Ahmadi, J. E. Suseno, Kang Eng Siew, I. Saad, R. Ismail, V. Arora
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引用次数: 3

摘要

本文模拟了二维p型纳米结构的载流子速度。由能带图可知,由于k = 0时重空穴与轻空穴之间的间隙较大,p型硅的有效质量(m*)主要由重空穴主导。基于零()阶的费米-狄拉克统计量进行二维载流子浓度计算,得到载流子的固有速度,即热速度vth。对二维载流子速度的结果进行了建模和模拟,并对不同温度和浓度下的简并态和非简并态进行了比较。结果表明,速度与浓度密切相关,在高浓度时与温度无关。
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Physics-Based Simulation of Carrier Velocity in 2-Dimensional P-Type MOSFET
The carrier velocity for 2-dimensional (2-D) p-type nanostructure was simulated in this paper. According to the energy band diagram, the effective mass (m*) in the p-type silicon is mostly dominated by heavy hole because of the large gap between heavy hole and light hole in k = 0. The carrier concentration calculation for 2-D, based on the Fermi – Dirac statistic on the order of zero ( ), was applied to obtain the intrinsic velocity of carrier, in the term of thermal velocity vth. The results for 2-D carrier velocity were modeled and simulated, and the comparison for degenerate and non-degenerate regime is presented for various temperature and concentration. It is revealed that the velocity is strongly dependent on concentration and becomes independent of temperature at high concentration.
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