扩散电流对MOS晶体管零温度点的影响

IF 0.1 0 THEATER Teatro e Storia Pub Date : 2005-12-19 DOI:10.1109/SMICND.2005.1558811
S. Eftimie, A. Rusu
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引用次数: 5

摘要

MOS晶体管的一个特殊特性是它的漏极电流在阈值电压附近有一个点,在这个点上它几乎不随温度变化。这被称为零tc (ZTC)点。考虑两种不同类型的MOSFET模型,一种是强反演模型,另一种是统一模型,可以看出,它们都表示ZTC点靠近被测点的位置(见表1)。正如本文所指出的,通常假设统一模型得到的较大值是由于漏极电流的亚阈值分量。这是因为强反演模型没有考虑到这一点。与该模型不同的是,统一模型认为漏极电流是扩散电流和漂移电流的总和,扩散电流在弱反转区占优势,漂移电流控制强反转区。因为ZTC点在这两个区域之间,通常假定扩散电流对它有影响。本文将回答这个问题,并试图解释其结果
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The influence of diffusion current on the zero-tc point of a MOS transistor
A special characteristic of a MOS transistor is that its drain current has a point somewhere around the threshold voltage where it almost doesn't vary with the temperature. This is called the Zero-TC (ZTC) point. By considering two different types of MOSFET models, a strong inversion and an unified one, it can see that both of them indicated the position of the ZTC point close to the measured one (sec Table 1). As this paper indicates, it is normally to presume that the larger value obtained with the unified model is due to the sub threshold component of the drain current. This is because the strong inversion model does not take it into account. Unlike this model, the unified one considers the drain current as a sum of the diffusion current, preponderant in weak inversion, and the drift current, which governs the strong inversion region. Because the ZTC point is somewhere between these two regions, it is normally to presume that the diffusion current has an influence on it. The paper will answer to this problem and will try to explain the results
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Teatro e Storia
Teatro e Storia THEATER-
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