UV/H2O2法去除饮用水中2-甲基异龙脑的优化研究

F. Tan, Haihan Chen, Daoji Wu, N. Lu, Zhimin Gao
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引用次数: 6

摘要

摘要2-甲基异冰片醇(2-MIB)是饮用水中常见的致臭化合物,气味阈值较低(10 ng/L)。由于常规处理工艺无法有效去除,本研究在实验室和中试中研究了一种先进的氧化技术:UV/H2O2分解化合物。结果表明:在室内试验中,随着H2O2浓度的增加,2-MIB的去除率提高;764 ng/L的2- mib与3.92 mg/L的H2O2反应8 min后降为2 ng/L;与1.93 mg/L的H2O2反应8 min后,702 ng/L的2-MIB降至42 ng/L;2-MIB的降解符合一级动力学。利用Design- Expert软件对中试数据进行分析,确定了最佳操作条件(H2O2投加量为6 mg/L, UV投加量为350 mJ/cm2, 2-MIB投加量为275 ng/L),最高2-MIB去除率为96.58%。通过该软件对实验数据进行拟合,得到了UV/H2O2与2-MIB的反应速率。
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Optimization of Removal of 2-methylisoborneol from Drinking Water using UV/H2O2
Abstract 2-methylisoborneol (2-MIB) is a common odor-causing compound in drinking water with a low odor threshold (10 ng/L). Since conventional treatment processes cannot effectively remove it, this study investigated an advanced oxidation technology: UV/H2O2 decomposing the compound in laboratory and pilot trials. The results show that, in the laboratory trials, the removal efficiency of 2-MIB increased with the concentration of H2O2 increasing; 764 ng/L of 2-MIB was reduced to 2 ng/L after 8 min reaction with 3.92 mg/L of H2O2; 702 ng/L of 2-MIB was reduced to 42 ng/L after 8 min reaction with 1.93 mg/L of H2O2; the degradation of 2-MIB conformed to first-order kinetics. The data obtained from the pilot trials was analyzed with software Design- Expert, determining the optimal operation conditions (the H2O2 dosage of 6 mg/L, the UV dose of 350 mJ/cm2, and the 2-MIB dose of 275 ng/L) with the highest 2-MIB removal percentage of 96.58%. The reaction rate between UV/H2O2 and 2-MIB was accessed through this software by fitting experimental data.
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来源期刊
CiteScore
0.88
自引率
0.00%
发文量
0
审稿时长
1 months
期刊介绍: The Journal of advanced oxidation technologies (AOTs) has been providing an international forum that accepts papers describing basic research and practical applications of these technologies. The Journal has been publishing articles in the form of critical reviews and research papers focused on the science and engineering of AOTs for water, air and soil treatment. Due to the enormous progress in the applications of various chemical and bio-oxidation and reduction processes, the scope of the Journal is now expanded to include submission in these areas so that high quality submission from industry would also be considered for publication. Specifically, the Journal is soliciting submission in the following areas (alphabetical order): -Advanced Oxidation Nanotechnologies -Bio-Oxidation and Reduction Processes -Catalytic Oxidation -Chemical Oxidation and Reduction Processes -Electrochemical Oxidation -Electrohydraulic Discharge, Cavitation & Sonolysis -Electron Beam & Gamma Irradiation -New Photocatalytic Materials and processes -Non-Thermal Plasma -Ozone-based AOTs -Photochemical Degradation Processes -Sub- and Supercritical Water Oxidation -TiO2 Photocatalytic Redox Processes -UV- and Solar Light-based AOTs -Water-Energy (and Food) Nexus of AOTs
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