{"title":"基于瞬态有限元的Cu/低k结构焊丝过程失效风险评估","authors":"J.Y. Wang, Cadmus C.A. Yuan, K. Chiang","doi":"10.1109/IMPACT56280.2022.9966720","DOIUrl":null,"url":null,"abstract":"This research establishes a set of transient finite element models to represent the mechanical impacts during the w/b process [1]. Moreover, a finite element model of the BEOL structure, which consisted of 7 layers of copper metal stacks and an aluminum pad to represent the current frequent-used technology, is established to investigate the stress pattern. The results show that both the Cu/low-k design and the w/b process parameters, including the free-air ball (FAB) size and w/b capillary, influence the maximum stress of the Cu/low-k structure. It is suggested that the w/b process of Cu/low-k structure should be precisely controlled, compared to the conventional w/b process of the Al/SiO4 structure, to maintain the low stress level of the Cu/low-k structure.","PeriodicalId":13517,"journal":{"name":"Impact","volume":"26 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2022-10-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Wire Boning Process Failure Risk Estimation of the Cu/low-k Structure using the Transient Finite Element\",\"authors\":\"J.Y. Wang, Cadmus C.A. Yuan, K. Chiang\",\"doi\":\"10.1109/IMPACT56280.2022.9966720\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This research establishes a set of transient finite element models to represent the mechanical impacts during the w/b process [1]. Moreover, a finite element model of the BEOL structure, which consisted of 7 layers of copper metal stacks and an aluminum pad to represent the current frequent-used technology, is established to investigate the stress pattern. The results show that both the Cu/low-k design and the w/b process parameters, including the free-air ball (FAB) size and w/b capillary, influence the maximum stress of the Cu/low-k structure. It is suggested that the w/b process of Cu/low-k structure should be precisely controlled, compared to the conventional w/b process of the Al/SiO4 structure, to maintain the low stress level of the Cu/low-k structure.\",\"PeriodicalId\":13517,\"journal\":{\"name\":\"Impact\",\"volume\":\"26 1\",\"pages\":\"1-4\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-10-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Impact\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMPACT56280.2022.9966720\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Impact","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMPACT56280.2022.9966720","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Wire Boning Process Failure Risk Estimation of the Cu/low-k Structure using the Transient Finite Element
This research establishes a set of transient finite element models to represent the mechanical impacts during the w/b process [1]. Moreover, a finite element model of the BEOL structure, which consisted of 7 layers of copper metal stacks and an aluminum pad to represent the current frequent-used technology, is established to investigate the stress pattern. The results show that both the Cu/low-k design and the w/b process parameters, including the free-air ball (FAB) size and w/b capillary, influence the maximum stress of the Cu/low-k structure. It is suggested that the w/b process of Cu/low-k structure should be precisely controlled, compared to the conventional w/b process of the Al/SiO4 structure, to maintain the low stress level of the Cu/low-k structure.