扫描阻抗显微镜(SIM):一种新的交流传输成像方法

IF 1.2 Q4 NANOSCIENCE & NANOTECHNOLOGY international journal of nano dimension Pub Date : 2016-12-01 DOI:10.7508/IJND.2016.04.002
M. Fardi, S. S. Hassani
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引用次数: 1

摘要

扫描阻抗显微镜(SIM)是一种新型的扫描探针显微镜(SPM)技术,它可以从样品表面获取图像,提供高横向分辨率的界面电容的定量信息,并研究界面的局部电容-电压(C-V)行为和交流输运性质。SIM卡是一个普通的AFM,配备了一个导电尖端(C-AFM),采用非接触模式与谐波检测成像。这种方法是基于局部检测表面电位或局部电压振荡的幅度和相位,这些振荡是由施加在样品上的横向周期性偏置引起的。SIM可以同时采集振幅和相位信号,并对表面形貌进行成像;然后,计算每个地图对应的直方图。因此,表面电位振荡的幅值和相位信号与样品阻抗有关。SIM还可以与表面电位显微镜(SSPM)集成。这些技术的结合为局部直流和交流输运性质的定量分析提供了一种方法。这些优点使SIM比其他SPM技术具有更高的分辨率,并表明其具有广泛应用的巨大潜力。SSPM和SIM的组合被证明是肖特基二极管,但可以应用于任何半导体器件。
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Scanning impedance microscopy (SIM): A novel approach for AC transport imaging
Scanning Impedance Microscopy (SIM) is one of the novel scanning probe microscopy (SPM) techniques, which has been developed to taking image from sample surface, providing quantitative information with high lateral resolution on the interface capacitance, and investigating the local capacitance–voltage (C–V) behavior of the interface and AC transport properties. The SIM is an ordinary AFM equipped with a conductive tip (C-AFM), which is imaged by non-contact mode with harmonic detection. This method is based on the local detection of surface potential or the amplitude and phase of local voltage oscillations induced by a lateral periodic bias applied across the sample. SIM can simultaneously collect the amplitude and phase signals and image the morphology of the surfaces; afterward, calculate the corresponding histogram for each map. Hence, the amplitude and phase signals of the surface potential oscillations are related to the sample impedance. SIM can also be integrated with Surface Potential Microscopy (SSPM). The combination of these techniques provides an approach for the quantitative analysis of local DC and AC transport properties. These advantages give SIM a higher resolution than other SPM techniques and indicate its immense potential for vast applications. The combination of SSPM and SIM were demonstrated for a Schottky diode, but can be applied to any semiconductor device.
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来源期刊
international journal of nano dimension
international journal of nano dimension NANOSCIENCE & NANOTECHNOLOGY-
CiteScore
2.80
自引率
20.00%
发文量
0
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