Junfu Liu , Zuhong Lu , Shiyong Zhao , Kongzhang Yang
{"title":"电沉积氧化二甲苯薄膜的电导率和光电响应","authors":"Junfu Liu , Zuhong Lu , Shiyong Zhao , Kongzhang Yang","doi":"10.1016/S0968-5677(98)00070-4","DOIUrl":null,"url":null,"abstract":"<div><p>Highly conductive polycrystalline and amorphous Tl<sub>2</sub>O<sub>3</sub> films are prepared by electrodeposition method. The resistivity of the polycrystalline film is lower than that of the amorphous one. A resisitivity of only 3.2×10<sup>-4</sup> <em><strong>Ω</strong></em> <!-->cm was obtained for the polycrystalline film. It is found that the electrodeposited Tl<sub>2</sub>O<sub>3</sub> films exhibit photoelectric response of n-type semiconductors. This photoelectric response may find use for further application of the Tl<sub>2</sub>O<sub>3</sub> films.</p></div>","PeriodicalId":22050,"journal":{"name":"Supramolecular Science","volume":"5 5","pages":"Pages 541-543"},"PeriodicalIF":0.0000,"publicationDate":"1998-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/S0968-5677(98)00070-4","citationCount":"2","resultStr":"{\"title\":\"Conductivity and photoelectric response of electrodeposited thallic oxide films\",\"authors\":\"Junfu Liu , Zuhong Lu , Shiyong Zhao , Kongzhang Yang\",\"doi\":\"10.1016/S0968-5677(98)00070-4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"<div><p>Highly conductive polycrystalline and amorphous Tl<sub>2</sub>O<sub>3</sub> films are prepared by electrodeposition method. The resistivity of the polycrystalline film is lower than that of the amorphous one. A resisitivity of only 3.2×10<sup>-4</sup> <em><strong>Ω</strong></em> <!-->cm was obtained for the polycrystalline film. It is found that the electrodeposited Tl<sub>2</sub>O<sub>3</sub> films exhibit photoelectric response of n-type semiconductors. This photoelectric response may find use for further application of the Tl<sub>2</sub>O<sub>3</sub> films.</p></div>\",\"PeriodicalId\":22050,\"journal\":{\"name\":\"Supramolecular Science\",\"volume\":\"5 5\",\"pages\":\"Pages 541-543\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-10-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"https://sci-hub-pdf.com/10.1016/S0968-5677(98)00070-4\",\"citationCount\":\"2\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Supramolecular Science\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://www.sciencedirect.com/science/article/pii/S0968567798000704\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Supramolecular Science","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0968567798000704","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Conductivity and photoelectric response of electrodeposited thallic oxide films
Highly conductive polycrystalline and amorphous Tl2O3 films are prepared by electrodeposition method. The resistivity of the polycrystalline film is lower than that of the amorphous one. A resisitivity of only 3.2×10-4Ω cm was obtained for the polycrystalline film. It is found that the electrodeposited Tl2O3 films exhibit photoelectric response of n-type semiconductors. This photoelectric response may find use for further application of the Tl2O3 films.
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