沉积电位和添加糖精对NiCoFeCu薄膜结构、磁性和磁阻特性的影响

Hilal Kuru, Hakan Köçkar, M. Alper
{"title":"沉积电位和添加糖精对NiCoFeCu薄膜结构、磁性和磁阻特性的影响","authors":"Hilal Kuru, Hakan Köçkar, M. Alper","doi":"10.1515/zna-2023-0137","DOIUrl":null,"url":null,"abstract":"Abstract NiCoFeCu films were electrodeposited on Ti substrates at different deposition potentials and different concentrations of saccharin added to solution. Compositional analysis showed that although Ni was the highest concentration in solution at low potentials of −1.0 V and −1.5 V, the Ni content was lower than the Co content in the films. Anomalous co-deposition behaviour of iron group metals was observed. When the deposition potential increased to −2.0 V and −2.5 V, the Ni content of films increased while the Co, Fe and Cu content decreased. In the case of saccharin addition to the solution, there is a slight change in the film content. All films have face-centred cubic structure. Structural analysis clearly showed that the potential has a significant effect on the texture degree of the films, since the crystal texture changed from (111) to (220) with increasing potential. The surface morphology of the films was observed to be affected by the deposition potential and saccharin concentration. For the magnetic analysis, saturation magnetisation, Ms value gradually decreased from 905 to 715 emu/cm3 with the variation of film content caused by the increase of the potential from −1.0 V to −2.5 V. And, a slight increase in Ms was detected with the addition of saccharin. Besides, the longitudinal and transverse magnetoresistance magnitudes increased from ∼2.5 % to 7.0 % with increasing deposition potential and all films exhibit anisotropic magnetoresistance. Films with desired magnetic properties can be obtained for potential use as magnetic materials in electronics such as magnetoresistive devices.","PeriodicalId":23871,"journal":{"name":"Zeitschrift für Naturforschung A","volume":"18 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-08-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Effect of deposition potential and saccharin addition on structural, magnetic and magnetoresistance characteristics of NiCoFeCu films\",\"authors\":\"Hilal Kuru, Hakan Köçkar, M. Alper\",\"doi\":\"10.1515/zna-2023-0137\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Abstract NiCoFeCu films were electrodeposited on Ti substrates at different deposition potentials and different concentrations of saccharin added to solution. Compositional analysis showed that although Ni was the highest concentration in solution at low potentials of −1.0 V and −1.5 V, the Ni content was lower than the Co content in the films. Anomalous co-deposition behaviour of iron group metals was observed. When the deposition potential increased to −2.0 V and −2.5 V, the Ni content of films increased while the Co, Fe and Cu content decreased. In the case of saccharin addition to the solution, there is a slight change in the film content. All films have face-centred cubic structure. Structural analysis clearly showed that the potential has a significant effect on the texture degree of the films, since the crystal texture changed from (111) to (220) with increasing potential. The surface morphology of the films was observed to be affected by the deposition potential and saccharin concentration. For the magnetic analysis, saturation magnetisation, Ms value gradually decreased from 905 to 715 emu/cm3 with the variation of film content caused by the increase of the potential from −1.0 V to −2.5 V. And, a slight increase in Ms was detected with the addition of saccharin. Besides, the longitudinal and transverse magnetoresistance magnitudes increased from ∼2.5 % to 7.0 % with increasing deposition potential and all films exhibit anisotropic magnetoresistance. Films with desired magnetic properties can be obtained for potential use as magnetic materials in electronics such as magnetoresistive devices.\",\"PeriodicalId\":23871,\"journal\":{\"name\":\"Zeitschrift für Naturforschung A\",\"volume\":\"18 1\",\"pages\":\"\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-08-03\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Zeitschrift für Naturforschung A\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1515/zna-2023-0137\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Zeitschrift für Naturforschung A","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1515/zna-2023-0137","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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摘要

摘要采用不同的沉积电位和不同浓度的糖精,在Ti衬底上电沉积NiCoFeCu薄膜。组分分析表明,在−1.0 V和−1.5 V的低电位下,溶液中Ni含量最高,但Ni含量低于Co含量。观察到铁族金属的异常共沉积行为。当沉积电位增加到−2.0 V和−2.5 V时,薄膜的Ni含量增加,Co、Fe和Cu含量减少。在溶液中加入糖精的情况下,薄膜含量稍有变化。所有薄膜均具有面心立方结构。结构分析清楚地表明,电势对薄膜的织构程度有显著的影响,随着电势的增大,薄膜的晶体织构由(111)变为(220)。沉积电位和糖精浓度对膜的表面形貌有影响。对于磁性分析,饱和磁化,随着膜含量的变化,电位从−1.0 V增加到−2.5 V, Ms值从905逐渐降低到715 emu/cm3。添加糖精后,Ms略有增加。此外,随着沉积电位的增加,纵向和横向磁电阻从~ 2.5 %增加到7.0 %,所有薄膜都表现出各向异性磁电阻。可以获得具有所需磁性能的薄膜,作为磁性材料在诸如磁阻器件等电子器件中的潜在用途。
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Effect of deposition potential and saccharin addition on structural, magnetic and magnetoresistance characteristics of NiCoFeCu films
Abstract NiCoFeCu films were electrodeposited on Ti substrates at different deposition potentials and different concentrations of saccharin added to solution. Compositional analysis showed that although Ni was the highest concentration in solution at low potentials of −1.0 V and −1.5 V, the Ni content was lower than the Co content in the films. Anomalous co-deposition behaviour of iron group metals was observed. When the deposition potential increased to −2.0 V and −2.5 V, the Ni content of films increased while the Co, Fe and Cu content decreased. In the case of saccharin addition to the solution, there is a slight change in the film content. All films have face-centred cubic structure. Structural analysis clearly showed that the potential has a significant effect on the texture degree of the films, since the crystal texture changed from (111) to (220) with increasing potential. The surface morphology of the films was observed to be affected by the deposition potential and saccharin concentration. For the magnetic analysis, saturation magnetisation, Ms value gradually decreased from 905 to 715 emu/cm3 with the variation of film content caused by the increase of the potential from −1.0 V to −2.5 V. And, a slight increase in Ms was detected with the addition of saccharin. Besides, the longitudinal and transverse magnetoresistance magnitudes increased from ∼2.5 % to 7.0 % with increasing deposition potential and all films exhibit anisotropic magnetoresistance. Films with desired magnetic properties can be obtained for potential use as magnetic materials in electronics such as magnetoresistive devices.
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