hiims的工业应用现状及未来展望,一家制造商的回顾介绍hiP-V hiPlus技术

G. Eichenhofer, I. Fernandez, A. Wennberg
{"title":"hiims的工业应用现状及未来展望,一家制造商的回顾介绍hiP-V hiPlus技术","authors":"G. Eichenhofer, I. Fernandez, A. Wennberg","doi":"10.13189/UJPA.2017.110301","DOIUrl":null,"url":null,"abstract":"It has been demonstrated by several groups that HiPIMS is a state of the art tool for applying demanding coatings with superior film properties. The real industrial breakthrough for the HiPIMS-technology has not yet happened. On the other hand, the up till now available HiPIMS-PS were mainly been up-scaled “prototypes”, far away from industrial work horses. With the hiP-V HiPIMS power system, a direct derivative of a robust power supply technology already in commercial use for public transportation systems, another milestone is set to make the HiPIMS technology go mainstream. HiPIMS is not a revolution that will make all other technologies obsolete, yet it is a very powerful complement. With a reliable, multi-functional power supply and with a rapid arc-handling, it could possibly be a start of a new era in thin film production. Just consider the possibility of etching and implantation to increase cleanliness and adhesion of the samples. Until now, most of the R&D work done in HiPIMS, has been dedicated to hard coatings and tool coatings. Here, HiPIMS is surely useful but not the expected technological breakthrough. For the future, the implementation of the new pos. reverse pulse, the hiP-V hiPlus HiPIMS technology, is opening a whole new field of possible applications for i.e. nonconductive substrates where no bias can be applied. Glass and plastics can be processed with remarkable results in hardness, enhanced film properties and additionally, it is achieved at lower substrate temperatures. It has been a slow start for HiPIMS, but the future looks bright.","PeriodicalId":23443,"journal":{"name":"Universal Journal of Physics and Application","volume":"1 1","pages":"73-79"},"PeriodicalIF":0.0000,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"10","resultStr":"{\"title\":\"Industrial Use of HiPIMS up to Now and a Glance into the Future, A Review by a Manufacturer Introduction of the hiP-V hiPlus Technology\",\"authors\":\"G. Eichenhofer, I. Fernandez, A. Wennberg\",\"doi\":\"10.13189/UJPA.2017.110301\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"It has been demonstrated by several groups that HiPIMS is a state of the art tool for applying demanding coatings with superior film properties. The real industrial breakthrough for the HiPIMS-technology has not yet happened. On the other hand, the up till now available HiPIMS-PS were mainly been up-scaled “prototypes”, far away from industrial work horses. With the hiP-V HiPIMS power system, a direct derivative of a robust power supply technology already in commercial use for public transportation systems, another milestone is set to make the HiPIMS technology go mainstream. HiPIMS is not a revolution that will make all other technologies obsolete, yet it is a very powerful complement. With a reliable, multi-functional power supply and with a rapid arc-handling, it could possibly be a start of a new era in thin film production. Just consider the possibility of etching and implantation to increase cleanliness and adhesion of the samples. Until now, most of the R&D work done in HiPIMS, has been dedicated to hard coatings and tool coatings. Here, HiPIMS is surely useful but not the expected technological breakthrough. For the future, the implementation of the new pos. reverse pulse, the hiP-V hiPlus HiPIMS technology, is opening a whole new field of possible applications for i.e. nonconductive substrates where no bias can be applied. Glass and plastics can be processed with remarkable results in hardness, enhanced film properties and additionally, it is achieved at lower substrate temperatures. It has been a slow start for HiPIMS, but the future looks bright.\",\"PeriodicalId\":23443,\"journal\":{\"name\":\"Universal Journal of Physics and Application\",\"volume\":\"1 1\",\"pages\":\"73-79\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2017-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"10\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Universal Journal of Physics and Application\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.13189/UJPA.2017.110301\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Universal Journal of Physics and Application","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.13189/UJPA.2017.110301","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 10

摘要

几个小组已经证明hiims是一种最先进的工具,用于应用具有优异薄膜性能的苛刻涂层。hipims技术的真正工业突破尚未发生。另一方面,迄今为止可用的HiPIMS-PS主要是放大的“原型”,距离工业工作马很远。hiP-V HiPIMS电力系统是一种已经用于公共交通系统的强大电源技术的直接衍生产品,它将使HiPIMS技术成为主流的又一个里程碑。HiPIMS不是一场革命,它将使所有其他技术过时,但它是一个非常强大的补充。有了可靠的多功能电源和快速的电弧处理,它可能是薄膜生产新时代的开始。只需考虑蚀刻和注入的可能性,以增加样品的清洁度和附着力。到目前为止,hihiims的大部分研发工作都致力于硬质涂层和刀具涂层。在这里,HiPIMS肯定是有用的,但不是预期的技术突破。对于未来,新的正反脉冲,hiP-V hiPlus hiims技术的实施,正在为无偏置的非导电基板开辟一个全新的应用领域。玻璃和塑料可以在硬度,增强薄膜性能方面取得显著的效果,另外,它可以在较低的基材温度下实现。对HiPIMS来说,这是一个缓慢的开始,但前景一片光明。
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Industrial Use of HiPIMS up to Now and a Glance into the Future, A Review by a Manufacturer Introduction of the hiP-V hiPlus Technology
It has been demonstrated by several groups that HiPIMS is a state of the art tool for applying demanding coatings with superior film properties. The real industrial breakthrough for the HiPIMS-technology has not yet happened. On the other hand, the up till now available HiPIMS-PS were mainly been up-scaled “prototypes”, far away from industrial work horses. With the hiP-V HiPIMS power system, a direct derivative of a robust power supply technology already in commercial use for public transportation systems, another milestone is set to make the HiPIMS technology go mainstream. HiPIMS is not a revolution that will make all other technologies obsolete, yet it is a very powerful complement. With a reliable, multi-functional power supply and with a rapid arc-handling, it could possibly be a start of a new era in thin film production. Just consider the possibility of etching and implantation to increase cleanliness and adhesion of the samples. Until now, most of the R&D work done in HiPIMS, has been dedicated to hard coatings and tool coatings. Here, HiPIMS is surely useful but not the expected technological breakthrough. For the future, the implementation of the new pos. reverse pulse, the hiP-V hiPlus HiPIMS technology, is opening a whole new field of possible applications for i.e. nonconductive substrates where no bias can be applied. Glass and plastics can be processed with remarkable results in hardness, enhanced film properties and additionally, it is achieved at lower substrate temperatures. It has been a slow start for HiPIMS, but the future looks bright.
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