薄膜中慢电子反射的量子尺寸效应

Robert L. Park, B.T. Jonker , H. Iwasaki , Q.-G. Zhu
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引用次数: 3

摘要

超低能电子(≥10 eV)入射到单晶基底外延膜上的透射系数由真空/薄膜和薄膜/基底界面反射的干涉调制。我们已经观察到不同体系的量子尺寸效应(QSE)振荡:Cu和Ag/W(110), Cu/Ni(001), Ag/Cu(111)和Ag和Cu/Si(111)-7 × 7,厚度从几层单层到~ 100 Å。在真空/薄膜或薄膜/衬底界面上,量子尺寸振荡对界面突然性的敏感性表现为在原子尺度上随无序度的增加而减小振幅。使用W(110) LEED(00)光束宽度作为薄膜沉积前由轻度离子轰击产生的衬底表面粗糙度的指标,我们发现,当Cu/W界面上的单原子步长密度从1增加到仅3%时,QSE振幅线性下降了70%。发现外延Cu/Ni(001)的量子尺寸振荡是1 ML分辨率下薄膜厚度从1到几十层的特征。基于LEED理论的单层晶体电子传输理论很好地解释了实验特征,其中包括对薄膜和衬底的能带结构的合理描述。
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Quantum size effects in the reflection of slow electrons from thin films

The transmission coefficient of very low energy electrons (⩽10 eV) incident on epitaxial films on single crystal substrates is modulated by interference between reflection at the vacuum/film and film/substrate interfaces. We have observed these quantum size effect (QSE) oscillations for various systems: Cu and Ag/W(110), Cu/Ni(001), Ag/Cu(111) and Ag and Cu/Si(111)-7 × 7 for thickness from a few monolayers to ∼ 100 Å. The sensitivity of the quantum size oscillations to the abruptness of the interfaces is illustrated by a reduction in their amplitude with increasing disorder on an atomic scale at either the vacuum/film or the film/substrate interface. Using the W(110) LEED (00) beam width as an index of substrate surface roughness produced by mild ion bombardment prior to film deposition, we find that the QSE amplitude decreases linearly by 70% for an increase in monoatomic step densities from 1 to only 3% at the Cu/W interface. Quantum size oscillations for epitaxial Cu/Ni(001) were found to be characteristic of the thickness of the film with 1 ML resolution from 1 to several tens of monolayers. The experimental features are well explained by a one-dimensional theory of electron transmission for overlayer crystal based on LEED theory and including a reasonable description of the band structures of the film and the substrate.

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