Ni - 40wt .% W和Ni - 50wt .% W涂层铜的热氧化

C. Panagopoulos, E. Georgiou, G. D. Plainakis
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摘要

摘要:本研究的重点是Ni-W电沉积涂层铜的氧化行为,其中含有约40和50 wt.%的钨,厚度约为15µm。这些材料的氧化动力学通过在空气中进行等温氧化试验来评估,在不同的温度(从550到850°C)和不同的持续时间(20分钟到2小时)。根据增重随时间变化的实验曲线,在选定的条件下得到了抛物线型氧化曲线,并对氧化速率进行了计算和比较。实验结果清楚地表明,钨的加入导致镍基体的抗氧化性能明显下降。氧化表面的后x射线衍射分析表明,氧化膜由NiO、WO2、WO3、W3O8、NiWO4和CuO(由于衬底氧化)组成。此外,还发生了晶粒生长现象,非晶结构向纳米晶和微晶转变,这可以从x射线衍射图中的结晶Ni峰看出。
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Thermal oxidation of Ni – 40 wt.% W and Ni – 50 wt.% W coated copper
ABSTRACT This work focuses on the oxidation behaviour of Ni-W electrodeposited coated copper, containing approximately 40 and 50 wt.% tungsten and having a thickness of about 15 µm. The oxidation kinetics of these materials were evaluated by performing isothermal oxidation tests in air, at different temperatures (from 550 up to 850°C) and for different durations (20 min up to 2 h). From the experimental curves of weight gain versus time, a parabolic oxidation pattern was obtained under the selected conditions and the oxidation rates were calculated and compared. The experimental results clearly indicate that the addition of tungsten resulted in a significant degradation of the oxidation resistance of the nickel matrix. Post X-ray diffraction analysis of the oxidised surfaces showed that the oxide film was composed of NiO, WO2, WO3, W3O8, NiWO4 and CuO (due to oxidation of the substrate). In addition, grain growth phenomena took place, as the amorphous structure shifted towards nanocrystalline and microcrystalline, which is indicated by the crystalline Ni peaks in the X-ray diffraction patterns.
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