Ar、Xe、Ne和Kr离子溅射Au-Cu合金的亚表面成分改性

T. Koshikawa
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摘要

以2 keV Ar、Xe、Ne和Kr离子溅射的Au-Cu合金和薄膜,在液氮和室温之间的温度下,出现了低能(Cu为60 eV, Au为69 eV)和高能(Au为239 eV, Cu为920 eV)的俄钻峰,表面和亚表面成分发生了变化。对于Au0.56Cu0.44合金,在表面上观察到Au的富集,而在表面下观察到Au的耗尽,并观察到高能量和低能的俄歇峰。但低能量俄歇峰评价的成分变化大于高能量俄歇峰评价的成分变化。这也计算了模拟溅射,包括离子辐射增强的偏析和扩散。这清楚地表明,吉本氏偏析在离子溅射合金表面和亚表面成分变化中起着重要的作用。用Ar、Xe、Ne和Kr溅射制备的Au-Cu薄膜合金,在低温(<-120℃)溅射过程中,除Xe外,其余共蒸发成分均保持不变。
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Subsurface compositional modification of Au-Cu alloys sputtered with Ar, Xe, Ne and Kr ions

Surface and subsurface compositional changes in Au-Cu alloys and thin films sputtered with 2 keV Ar, Xe, Ne and Kr ions were observed with low energy (60 eV for Cu and 69 eV for Au) and high energy (239 eV for Au and 920 eV for Cu) Auger peaks at temperatures between liquid nitrogen and room temperature. For a Au0.56Cu0.44 alloy, Au enrichment at the surface and depletion beneath the surface was observed with high energy as well as low energy Auger peaks. But the compositional change assessed with low energy Auger peaks is greater than that assessed with high energy peaks. This was also calculated with the simulation of sputtering including ion radiation-enhanced segregation and diffusion. This shows clearly that the Gibbsian segregation plays an important role in composition changes at the surface and subsurface of the ion-sputtered alloy. Compositional changes of Au-Cu thin film alloys prepared by the co-evaporation technique were also observed following sputtering with Ar, Xe, Ne and Kr. Except in the case of Xe, the coevaporated composition was preserved during sputtering at low temperatures (<-120°C).

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