具有ii型超晶格活性层的nBn探测器的价带势垒

IF 1.3 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC Opto-Electronics Review Pub Date : 2023-04-01 DOI:10.24425/opelre.2021.135823
M. Kopytko, E. Gomółka, T. Manyk, K. Michalczewski, Ł. Kubiszyn, J. Rutkowski, P. Martyniuk
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引用次数: 0

摘要

本文对ii型超晶格(T2SL)势垒(nBn)探测器在高温下的暗电流(Id)进行了数值分析。理论计算与实验结果比较了吸收层和接触层在InAs/InAsSb超晶格分离的AlAsSb势垒中的nBn探测器。利用MBE技术在GaAs衬底上生长了探测器结构。利用k·p模型确定了T2SL的第一电子带、第一重空穴带和第一轻空穴带,并计算了吸收系数。本文讨论了附加空穴势垒对nBn结构电学和光学参数的影响。根据nBn探测器的工作原理,电子势垒是为了防止电流从接触层流向吸收器,而空穴势垒应足够低,以保证光生载流子的流动。通过改变三元AlAsSb材料的电子亲和力来调节价带(VB)的势垒高度。在假设VB中存在高势垒的情况下,得到了与实验数据相似的数值计算结果,同时降低了探测器的电流响应率。
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Barrier in the valence band in the nBn detector with an active layer from the type-II superlattice
Article history: Received 11 Sep. 2020 Received in revised form 8 Oct. 2020 Accepted 18 Oct 2020 Numerical analysis of the dark current (Id) in the type-II superlattice (T2SL) barrier (nBn) detector operated at high temperatures was presented. Theoretical calculations were compared with the experimental results for the nBn detector with the absorber and contact layers in an InAs/InAsSb superlattice separated AlAsSb barrier. Detector structure was grown using MBE technique on a GaAs substrate. The k·p model was used to determine the first electron band and the first heavy and light hole bands in T2SL, as well as to calculate the absorption coefficient. The paper presents the effect of the additional hole barrier on electrical and optical parameters of the nBn structure. According to the principle of the nBn detector operation, the electrons barrier is to prevent the current flow from the contact layer to the absorber, while the holes barrier should be low enough to ensure the flow of optically generated carriers. The barrier height in the valence band (VB) was adjusted by changing the electron affinity of a ternary AlAsSb material. Results of numerical calculations similar to the experimental data were obtained, assuming the presence of a high barrier in VB which, at the same time, lowered the detector current responsivity.
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来源期刊
Opto-Electronics Review
Opto-Electronics Review 工程技术-工程:电子与电气
CiteScore
1.90
自引率
12.50%
发文量
0
审稿时长
>12 weeks
期刊介绍: Opto-Electronics Review is peer-reviewed and quarterly published by the Polish Academy of Sciences (PAN) and the Association of Polish Electrical Engineers (SEP) in electronic version. It covers the whole field of theory, experimental techniques, and instrumentation and brings together, within one journal, contributions from a wide range of disciplines. The scope of the published papers includes any aspect of scientific, technological, technical and industrial works concerning generation, transmission, transformation, detection and application of light and other forms of radiative energy whose quantum unit is photon. Papers covering novel topics extending the frontiers in optoelectronics or photonics are very encouraged. It has been established for the publication of high quality original papers from the following fields: Optical Design and Applications, Image Processing Metamaterials, Optoelectronic Materials, Micro-Opto-Electro-Mechanical Systems, Infrared Physics and Technology, Modelling of Optoelectronic Devices, Semiconductor Lasers Technology and Fabrication of Optoelectronic Devices, Photonic Crystals, Laser Physics, Technology and Applications, Optical Sensors and Applications, Photovoltaics, Biomedical Optics and Photonics
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