反中性束注入下大螺旋装置等离子体中热脉冲在合理表面上的传播

M. Yakovlev, S. Inagaki, T. Shimozuma, S. Kubo, T. Morisaki, Y. Nagayama, K. Kawahata, A. Komori
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引用次数: 8

摘要

在一个大型螺旋装置中观察到核心电子温度分布变平[a]。Iiyoshi等人。诊断。核聚变39,1245(1999)]用反中性束注入内移等离子体。为了研究这一现象,采用轴向电子回旋加速器加热功率调制进行了热脉冲实验。在m∕n=2∕1有理面(m、n分别为极向模态数和环向模态数)附近观察到热脉冲传播的独特特征。给出了温度扰动在径向分离磁通表面上的同步响应。磁岛结构引起的磁场拓扑结构的变化可以解释这种非单调热脉冲的传播。岛的估计o点位置位于m∕n=2∕1有理面附近。
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Heat Pulse Propagation across the Rational Surface in Large Helical Device Plasma with Counter Neutral Beam Injection
Core electron temperature profile flattening is observed in a large helical device [A. Iiyoshi et al. Nucl. Fusion 39, 1245 (1999)] inward shifted plasma with counter-neutral beam injection. To study this phenomenon, heat pulse experiments are performed by on-axis electron cyclotron heating power modulation. A unique feature of heat pulse propagation is observed near the m∕n=2∕1 rational surface (m, n are the poloidal and toroidal mode numbers, respectively). A simultaneous response of the temperature perturbation on radially separated flux surfaces is shown. The change in the magnetic field topology due to the presence of a magnetic island structure can explain this nonmonotonic heat pulse propagation. The estimated O-point position of the island is located near the m∕n=2∕1 rational surface.
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