用于光互连的纳米级光源

N. Li, K. Han, Sorger, D. Sadana
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引用次数: 1

摘要

这篇社论旨在解决纳米级光源的两个关键方面:(1)低功耗光通信和(2)单片硅集成的晶体学缺陷工程。我们将进一步讨论下一代高密度光互连的纳米级光源的机遇和挑战。亚光波长的光源由于其在光通信中的多功能性,设计和原型制作一直是人们感兴趣的话题。例如,纳米光源可以在数百GHz的频率下工作[1,2],这是传统光源[3]无法做到的。此外,通过省略调制器并使用直接源调制对光学数据进行编码,可以降低与这些光源互连时的功耗[4]。目前正在研究的纳米光源有:(i)小光子模式激光器[5-9],(ii)等离子体激光器[10,11],(iii)光子-等离子体混合激光器[12-15]和(iv)纳米级led[16,17]。下面将讨论这些纳米光源的优缺点。
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Nanoscale Light Sources for Optical Interconnects
This editorial is aimed at addressing two key aspects of nanoscale light sources: (1) low-power optical communication and (2) crystallographic defect engineering for monolithic integration with silicon. We will further discuss opportunities and challenges for nanoscale light sources for next generation, high density optical interconnect. Designing and prototyping light sources with sub light wavelength dimensions has been the topic of keen interest because of their versatility in optical communication. For example, nano light sources can operate at hundreds of GHz [1,2] which is not possible with conventional light sources [3]. In addition, power consumption in interconnects with these light sources can be reduced by omitting the modulator and using direct source modulation to encode optical data [4]. There are a number of nano light sources under investigation: (i) small photonic mode laser [5-9], (ii) plasmonic lasers [10,11] (iii) photonic-plasmonic hybrid lasers [12-15] and (iv) nanoscale LEDs [16,17]. Pros and cons of these nano light sources are discussed below.
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