{"title":"低电阻率硅SU-S厚负光刻胶上的低损耗共面线","authors":"R. Marcelli, S. Catoni, L. Frenguelli","doi":"10.1109/SMICND.2005.1558722","DOIUrl":null,"url":null,"abstract":"In this paper a new approach to obtain low losses coplanar waveguide (CPW) lines is described. A photolithographic process is performed by using SU-S thick negative photo-resist on low resistivity silicon to obtain CPW lines elevated with respect to the substrate to get the advantages from transmission line structures which are almost on-the-air.","PeriodicalId":40779,"journal":{"name":"Teatro e Storia","volume":null,"pages":null},"PeriodicalIF":0.1000,"publicationDate":"2005-12-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":"{\"title\":\"Low loss coplanar lines on low resistivity silicon SU-S thick negative photoresist\",\"authors\":\"R. Marcelli, S. Catoni, L. Frenguelli\",\"doi\":\"10.1109/SMICND.2005.1558722\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper a new approach to obtain low losses coplanar waveguide (CPW) lines is described. A photolithographic process is performed by using SU-S thick negative photo-resist on low resistivity silicon to obtain CPW lines elevated with respect to the substrate to get the advantages from transmission line structures which are almost on-the-air.\",\"PeriodicalId\":40779,\"journal\":{\"name\":\"Teatro e Storia\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.1000,\"publicationDate\":\"2005-12-19\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"7\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Teatro e Storia\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/SMICND.2005.1558722\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"0\",\"JCRName\":\"THEATER\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Teatro e Storia","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/SMICND.2005.1558722","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"0","JCRName":"THEATER","Score":null,"Total":0}
Low loss coplanar lines on low resistivity silicon SU-S thick negative photoresist
In this paper a new approach to obtain low losses coplanar waveguide (CPW) lines is described. A photolithographic process is performed by using SU-S thick negative photo-resist on low resistivity silicon to obtain CPW lines elevated with respect to the substrate to get the advantages from transmission line structures which are almost on-the-air.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
